IMR OpenIR
Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering
Shi, W. B.1,2; Liu, Y. M.3; Li, W. H.1,2; Li, T.1,2; Lei, H.1; Gong, J.1; Sun, C.1
Corresponding AuthorSun, C.(csun@imr.ac.cn)
2021-08-09
Source PublicationACTA METALLURGICA SINICA-ENGLISH LETTERS
ISSN1006-7191
Pages10
AbstractThe influence of the bilayer number on the microstructure, mechanical properties, adhesion strength and tribological behaviors of the WB2/Cr multilayer films was systematically investigated in the present study. Five groups of WB2/Cr films with the same modulation ratio were synthesized by magnetron sputtering technique. The crystalline structure of the films was determined by X-ray diffraction. The morphologies and the microstructure of the films were observed by scanning electron microscopy, atomic force microscopy and transmission electron microscopy. Furthermore, Nano indenter, scratch tester and ball-on-disc tribometer were used to evaluate the mechanical and tribological properties. As bilayer numbers varied from 5 to 40, the hardness increased first and then decreased with the maximum hardness of 33.9 GPa when the bilayer number is 30. The H/E* and H-3/E-*2 values calculated to evaluate the fracture toughness showed the similar changing trend with hardness. The adhesion strength reached the maximum of 67 N when the bilayer number is 30. The surface roughness and friction coefficient decreased with increasing bilayer number. The wear mechanism was also investigated, and the results suggested that the multilayer film with bilayer number of 30 exhibited the best wear resistance (1.78 x 10(-7) mm(3)/Nm), benefiting from the contribution of high hardness, fracture toughness and adhesion strength.
KeywordWB2 Cr multilayer Magnetron sputtering Bilayer number Tribological behavior
Funding OrganizationNational Natural Science Foundation of China
DOI10.1007/s40195-021-01285-3
Indexed BySCI
Languageen
Funding ProjectNational Natural Science Foundation of China[51701157]
WOS Research AreaMetallurgy & Metallurgical Engineering
WOS SubjectMetallurgy & Metallurgical Engineering
WOS IDWOS:000683323900001
PublisherCHINESE ACAD SCIENCES, INST METAL RESEARCH
Citation statistics
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/159543
Collection中国科学院金属研究所
Corresponding AuthorSun, C.
Affiliation1.Chinese Acad Sci, Shi Changxu Innovat Ctr Adv Mat, Inst Met Res, Shenyang 110016, Peoples R China
2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China
3.Xian Shiyou Univ, Coll Mat Sci & Engn, Xian 710065, Peoples R China
Recommended Citation
GB/T 7714
Shi, W. B.,Liu, Y. M.,Li, W. H.,et al. Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering[J]. ACTA METALLURGICA SINICA-ENGLISH LETTERS,2021:10.
APA Shi, W. B..,Liu, Y. M..,Li, W. H..,Li, T..,Lei, H..,...&Sun, C..(2021).Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering.ACTA METALLURGICA SINICA-ENGLISH LETTERS,10.
MLA Shi, W. B.,et al."Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering".ACTA METALLURGICA SINICA-ENGLISH LETTERS (2021):10.
Files in This Item:
There are no files associated with this item.
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Shi, W. B.]'s Articles
[Liu, Y. M.]'s Articles
[Li, W. H.]'s Articles
Baidu academic
Similar articles in Baidu academic
[Shi, W. B.]'s Articles
[Liu, Y. M.]'s Articles
[Li, W. H.]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Shi, W. B.]'s Articles
[Liu, Y. M.]'s Articles
[Li, W. H.]'s Articles
Terms of Use
No data!
Social Bookmark/Share
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.