| Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering | |
| Shi, W. B.1,2; Liu, Y. M.3; Li, W. H.1,2; Li, T.1,2; Lei, H.1; Gong, J.1; Sun, C.1 | |
| Corresponding Author | Sun, C.(csun@imr.ac.cn) |
| 2021-08-09 | |
| Source Publication | ACTA METALLURGICA SINICA-ENGLISH LETTERS
 |
| ISSN | 1006-7191 |
| Pages | 10 |
| Abstract | The influence of the bilayer number on the microstructure, mechanical properties, adhesion strength and tribological behaviors of the WB2/Cr multilayer films was systematically investigated in the present study. Five groups of WB2/Cr films with the same modulation ratio were synthesized by magnetron sputtering technique. The crystalline structure of the films was determined by X-ray diffraction. The morphologies and the microstructure of the films were observed by scanning electron microscopy, atomic force microscopy and transmission electron microscopy. Furthermore, Nano indenter, scratch tester and ball-on-disc tribometer were used to evaluate the mechanical and tribological properties. As bilayer numbers varied from 5 to 40, the hardness increased first and then decreased with the maximum hardness of 33.9 GPa when the bilayer number is 30. The H/E* and H-3/E-*2 values calculated to evaluate the fracture toughness showed the similar changing trend with hardness. The adhesion strength reached the maximum of 67 N when the bilayer number is 30. The surface roughness and friction coefficient decreased with increasing bilayer number. The wear mechanism was also investigated, and the results suggested that the multilayer film with bilayer number of 30 exhibited the best wear resistance (1.78 x 10(-7) mm(3)/Nm), benefiting from the contribution of high hardness, fracture toughness and adhesion strength. |
| Keyword | WB2 Cr multilayer Magnetron sputtering Bilayer number Tribological behavior |
| Funding Organization | National Natural Science Foundation of China |
| DOI | 10.1007/s40195-021-01285-3 |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | National Natural Science Foundation of China[51701157] |
| WOS Research Area | Metallurgy & Metallurgical Engineering |
| WOS Subject | Metallurgy & Metallurgical Engineering |
| WOS ID | WOS:000683323900001 |
| Publisher | CHINESE ACAD SCIENCES, INST METAL RESEARCH |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/159543 |
| Collection | 中国科学院金属研究所 |
| Corresponding Author | Sun, C. |
| Affiliation | 1.Chinese Acad Sci, Shi Changxu Innovat Ctr Adv Mat, Inst Met Res, Shenyang 110016, Peoples R China 2.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Peoples R China 3.Xian Shiyou Univ, Coll Mat Sci & Engn, Xian 710065, Peoples R China |
| Recommended Citation GB/T 7714 | Shi, W. B.,Liu, Y. M.,Li, W. H.,et al. Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering[J]. ACTA METALLURGICA SINICA-ENGLISH LETTERS,2021:10. |
| APA | Shi, W. B..,Liu, Y. M..,Li, W. H..,Li, T..,Lei, H..,...&Sun, C..(2021).Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering.ACTA METALLURGICA SINICA-ENGLISH LETTERS,10. |
| MLA | Shi, W. B.,et al."Microstructure and Properties of WB2/Cr Multilayer Films with Different Bilayer Numbers Deposited by Magnetron Sputtering".ACTA METALLURGICA SINICA-ENGLISH LETTERS (2021):10. |
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