Thermal and Mechanical Variation Analysis on Multi-Layer Thin Wall during Continuous Laser Deposition, Continuous Pulsed Laser Deposition, and Interval Pulsed Laser Deposition | |
Ma, Liang1,2; Kong, Xiangwei1; Liang, Jingjing2; Li, Jinguo2; Sun, Cong1; Jin, Zhibo1; Jiao, Zhidong3 | |
Corresponding Author | Kong, Xiangwei(shawnkongneu@163.com) ; Liang, Jingjing(jjliang@imr.ac.cn) ; Li, Jinguo(jgli@imr.ac.cn) |
2022-08-01 | |
Source Publication | MATERIALS
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Volume | 15Issue:15Pages:19 |
Abstract | Direct laser deposition (DLD) is widely used in precision manufacturing, but the process parameters (e.g., laser power, scanning patterns) easily lead to changes in dimensional accuracy and structural properties. Many methods have been proposed to analyze the principle of distortion and residual stress generation, but it is difficult to evaluate the involvement of temperature and stress in the process of rapid melting and solidification. In this paper, a three-dimensional finite element model is established based on thermal-mechanical relationships in multilayer DLD. Differences in temperature and residual stress between continuous laser deposition (CLD) and pulsed laser deposition (PLD) are compared with the numerical model. To validate the relationship, the temperature and residual stress values obtained by numerical simulation are compared with the values obtained by the HIOKI-LR8431 temperature logger and the Pulstec mu-X360s X-ray diffraction (XRD) instrument. The results indicate that the temperature and residual stress of the deposition part can be evaluated by the proposed simulation model. The proposed PLD process, which includes continuous pulsed laser deposition (CPLD) and interval pulsed laser deposition (IPLD), were found more effective to improve the homogeneity of temperature and residual stress than the CLD process. This study is expected to be useful in the distortion control and microstructure consistency of multilayer deposited parts. |
Keyword | direct laser deposition (DLD) pulsed laser finite element model heat transfer residual stress |
Funding Organization | National Key Research and Development Program of China ; National Science and Technology Major Project ; State Ministry of Science and Technology Innovation Fund of China |
DOI | 10.3390/ma15155157 |
Indexed By | SCI |
Language | 英语 |
Funding Project | National Key Research and Development Program of China[SQ2019YFB1704500] ; National Science and Technology Major Project[2019-VII-0019-0161] ; National Science and Technology Major Project[J2019-V-0009-0103] ; State Ministry of Science and Technology Innovation Fund of China[2018IM030200] |
WOS Research Area | Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering ; Physics |
WOS Subject | Chemistry, Physical ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering ; Physics, Applied ; Physics, Condensed Matter |
WOS ID | WOS:000838914400001 |
Publisher | MDPI |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.imr.ac.cn/handle/321006/174549 |
Collection | 中国科学院金属研究所 |
Corresponding Author | Kong, Xiangwei; Liang, Jingjing; Li, Jinguo |
Affiliation | 1.Northeastern Univ, Sch Mech Engn & Automat, Shenyang 110819, Peoples R China 2.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China 3.CRRC Qingdao Sifang Co Ltd, Qingdao 266000, Peoples R China |
Recommended Citation GB/T 7714 | Ma, Liang,Kong, Xiangwei,Liang, Jingjing,et al. Thermal and Mechanical Variation Analysis on Multi-Layer Thin Wall during Continuous Laser Deposition, Continuous Pulsed Laser Deposition, and Interval Pulsed Laser Deposition[J]. MATERIALS,2022,15(15):19. |
APA | Ma, Liang.,Kong, Xiangwei.,Liang, Jingjing.,Li, Jinguo.,Sun, Cong.,...&Jiao, Zhidong.(2022).Thermal and Mechanical Variation Analysis on Multi-Layer Thin Wall during Continuous Laser Deposition, Continuous Pulsed Laser Deposition, and Interval Pulsed Laser Deposition.MATERIALS,15(15),19. |
MLA | Ma, Liang,et al."Thermal and Mechanical Variation Analysis on Multi-Layer Thin Wall during Continuous Laser Deposition, Continuous Pulsed Laser Deposition, and Interval Pulsed Laser Deposition".MATERIALS 15.15(2022):19. |
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