Thermal and Mechanical Variation Analysis on Multi-Layer Thin Wall during Continuous Laser Deposition, Continuous Pulsed Laser Deposition, and Interval Pulsed Laser Deposition

doi:10.3390/ma15155157

IMR OpenIR

	Thermal and Mechanical Variation Analysis on Multi-Layer Thin Wall during Continuous Laser Deposition, Continuous Pulsed Laser Deposition, and Interval Pulsed Laser Deposition
	Ma, Liang 1,2; Kong, Xiangwei 1; Liang, Jingjing 2; Li, Jinguo 2; Sun, Cong 1; Jin, Zhibo 1; Jiao, Zhidong 3
通讯作者	Kong, Xiangwei(shawnkongneu@163.com) ; Liang, Jingjing(jjliang@imr.ac.cn) ; Li, Jinguo(jgli@imr.ac.cn)
	2022-08-01
发表期刊	MATERIALS
卷号	15 期号:15 页码:19
摘要	Direct laser deposition (DLD) is widely used in precision manufacturing, but the process parameters (e.g., laser power, scanning patterns) easily lead to changes in dimensional accuracy and structural properties. Many methods have been proposed to analyze the principle of distortion and residual stress generation, but it is difficult to evaluate the involvement of temperature and stress in the process of rapid melting and solidification. In this paper, a three-dimensional finite element model is established based on thermal-mechanical relationships in multilayer DLD. Differences in temperature and residual stress between continuous laser deposition (CLD) and pulsed laser deposition (PLD) are compared with the numerical model. To validate the relationship, the temperature and residual stress values obtained by numerical simulation are compared with the values obtained by the HIOKI-LR8431 temperature logger and the Pulstec mu-X360s X-ray diffraction (XRD) instrument. The results indicate that the temperature and residual stress of the deposition part can be evaluated by the proposed simulation model. The proposed PLD process, which includes continuous pulsed laser deposition (CPLD) and interval pulsed laser deposition (IPLD), were found more effective to improve the homogeneity of temperature and residual stress than the CLD process. This study is expected to be useful in the distortion control and microstructure consistency of multilayer deposited parts.
关键词	direct laser deposition (DLD) pulsed laser finite element model heat transfer residual stress
资助者	National Key Research and Development Program of China ; National Science and Technology Major Project ; State Ministry of Science and Technology Innovation Fund of China
DOI	10.3390/ma15155157
收录类别	SCI
语种	英语
资助项目	National Key Research and Development Program of China[SQ2019YFB1704500] ; National Science and Technology Major Project[2019-VII-0019-0161] ; National Science and Technology Major Project[J2019-V-0009-0103] ; State Ministry of Science and Technology Innovation Fund of China[2018IM030200]
WOS研究方向	Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering ; Physics
WOS类目	Chemistry, Physical ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering ; Physics, Applied ; Physics, Condensed Matter
WOS记录号	WOS:000838914400001
出版者	MDPI
引用统计	被引频次：5[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/174549
专题	中国科学院金属研究所
通讯作者	Kong, Xiangwei; Liang, Jingjing; Li, Jinguo
作者单位	1.Northeastern Univ, Sch Mech Engn & Automat, Shenyang 110819, Peoples R China 2.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China 3.CRRC Qingdao Sifang Co Ltd, Qingdao 266000, Peoples R China
推荐引用方式 GB/T 7714	Ma, Liang,Kong, Xiangwei,Liang, Jingjing,et al. Thermal and Mechanical Variation Analysis on Multi-Layer Thin Wall during Continuous Laser Deposition, Continuous Pulsed Laser Deposition, and Interval Pulsed Laser Deposition[J]. MATERIALS,2022,15(15):19.
APA	Ma, Liang.,Kong, Xiangwei.,Liang, Jingjing.,Li, Jinguo.,Sun, Cong.,...&Jiao, Zhidong.(2022).Thermal and Mechanical Variation Analysis on Multi-Layer Thin Wall during Continuous Laser Deposition, Continuous Pulsed Laser Deposition, and Interval Pulsed Laser Deposition.MATERIALS,15(15),19.
MLA	Ma, Liang,et al."Thermal and Mechanical Variation Analysis on Multi-Layer Thin Wall during Continuous Laser Deposition, Continuous Pulsed Laser Deposition, and Interval Pulsed Laser Deposition".MATERIALS 15.15(2022):19.