Three-dimensional numerical simulation of light field modulation in the vicinity of inclusions in silica subsurface

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	Three-dimensional numerical simulation of light field modulation in the vicinity of inclusions in silica subsurface
	J. R. Hua; L. Li; X. Xiang; X. T. Zu
	2011
发表期刊	Acta Physica Sinica
ISSN	1000-3290
卷号	60 期号:4
摘要	One of the important factors of the low laser induced damage threshold is the defects in the subsurface of fused silica. The three-dimensional model of a spherical inclusion in the subsurface is established in this study. Three-dimensional finite-difference time-domain method is used to calculate and simulate the light field distribution in the vicinity of inclusions. The effects of dielectric constant and inclusion size are analyzed, separately. The results show that the light intensity enhancement factor (LIEF) does not change with the size and the dielectric constant of the inclusions when the dielectric constant is smaller than that of fused silica, where the LIEF is kept at about 4. When the dielectric constant is 6. 0, the LIEFs are 50. 1588, 73. 3904 and 102. 9953 for the inclusions with sizes of 1. 5 lambda, 2 lambda and 2. 5 lambda respectively. When the inclusion size is constant, the LIEF will increase with the increase of dielectric constant. The light enhancement for the round inclusions is much higher than that for the ellipsoidal inclusions. Therefore, the round inclusions with large size and dielectric constant significantly enhance the electric field.
部门归属	[hua jin-rong; li li; xiang xia; zu xiao-tao] univ elect sci & technol china, inst phys & elect, chengdu 610054, peoples r china. [zu xiao-tao] chinese acad sci, int ctr mat phys, shenyang 110015, peoples r china.;zu, xt (reprint author), univ elect sci & technol china, inst phys & elect, chengdu 610054, peoples r china;xtzu@uestc.edu.cn
关键词	Inclusion 3d Fdtd Numerical Calculation Lief Laser-induced Damage Temperature-dependence Crystalline Silicon Ion-implantation Fused-silica Thin-films Sol-gel Luminescence Glass Sio2
URL	查看原文
WOS记录号	WOS:000289863100038
引用统计	被引频次：12[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/30402
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	J. R. Hua,L. Li,X. Xiang,et al. Three-dimensional numerical simulation of light field modulation in the vicinity of inclusions in silica subsurface[J]. Acta Physica Sinica,2011,60(4).
APA	J. R. Hua,L. Li,X. Xiang,&X. T. Zu.(2011).Three-dimensional numerical simulation of light field modulation in the vicinity of inclusions in silica subsurface.Acta Physica Sinica,60(4).
MLA	J. R. Hua,et al."Three-dimensional numerical simulation of light field modulation in the vicinity of inclusions in silica subsurface".Acta Physica Sinica 60.4(2011).