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题名: Preparation of graphene by chemical vapor deposition
作者: W. C. Ren;  L. B. Gao;  L. P. Ma;  H. M. Cheng
发表日期: 2011
关键词: Graphene;  Preparation;  Chemical vapor deposition;  Transfer;  few-layer graphene;  epitaxial graphene;  large-area;  carbon;  films;  surfaces;  nickel;  phase
摘要: Chemical vapor deposition (CVD) is an effective way for the preparation of graphene with large area and high quality. In this review, the mechanism and characteristics of the four main preparation methods of graphene are briefly introduced, including micromechanical cleavage, chemical exfoliation, SiC epitaxial growth and CVD. The recent advances in the CVD growth of graphene and the related transfer techniques in terms of structure control, quality improvement and large area graphene synthesis were discussed. Other possible methods for the CVD growth of graphene were analyzed including the synthesis and nondestructive transfer of large area single crystalline graphene, graphene nanoribbons and graphene macrostructures.
部门归属: [Ren Wen-cai; Gao Li-bo; Ma Lai-peng; Cheng Hui-ming] Chinese Acad Sci, Shenyang Natl Lab Mat Sci, Inst Met Res, Shenyang 110016, Peoples R China.;Ren, WC (reprint author), Chinese Acad Sci, Shenyang Natl Lab Mat Sci, Inst Met Res, Shenyang 110016, Peoples R China;
相关网址: <Go to ISI>://WOS:000288313600015
刊名: New Carbon Materials
内容类型: 期刊论文
ISSN号: 1007-8827
KOS主题词: Graphene;  preparation;  Chemical vapor deposition;  atomic layer deposition;  Vapor-plating;  Transfer;  Carbon;  Bore;  Photography--Films;  Finite volume method;  Surfaces;  Nickel;  phase
KOS主题词(UF): CVD (Chemical vapor deposition);  Deposition, Chemical vapor;  Vapor deposition, Chemical;  CHEMISCHE BESCHICHTUNG AUS DAMPFPHASE;  REVETEMENT CHIMIQUE EN PHASE VAPEUR;  atomic layer epitaxial growth;  ALE;  MLE growth;  molecular layer epitaxial growth;  chemical beam epitaxial growth;  CBE;  gas source MBE;  GSMBE;  metalorganic molecular beam epitaxy;  MOMBE;  OMMBE;  chemical vapour deposition;  APCVD;  CVD;  laser CVD;  laser-induced CVD;  LPCVD;  chemical vapour infiltration;  chemical vapor infiltration;  CVI;  crystal growth from vapour;  laser deposition;  MOCVD;  metalorganic chemical vapour deposition;  MOVPE;  OMCVD;  OMVPE;  molecular beam epitaxial growth;  MBE;  migration-enhanced epitaxy;  vapour phase epitaxial growth;  hot wall epitaxial growth;  vapor phase epitaxial growth;  VPE;  CVI (fabrication);  ALD;  Molecular beam epitaxy;  Coulomb-Bethe;  many-body expansion;  真空镀膜;  Coating, Vacuum;  Deposition, Vapor;  Vacuum coating;  Vacuum metallizing;  Vapor deposition;  Vapor-phase deposition;  BEDAMFUNG;  DEPOSITION DE LA PHASE VAPEUR;  CVD (deposition);  transferring;  C;  carbon nanotubes;  diamond-like carbon;  DLC;  discotic liquid crystals;  discophases;  nanotube devices;  C (envelope sizes);  C (US paper size);  Cytosine;  carbon nano-sized tubes;  carbon nano tubes;  carbon nanoscale tubes;  carbon nanotubules;  无机发光材料;  [+];  BOR;  BORON;  CARBONE;  KALIUM;  KOHLENSTOFF;  PHOSPHOR;  PHOSPHORE;  PHOSPHORUS;  POTASSIUM;  POTASSIUM (FRANCAIS);  SCHWEFEL;  SOUFRE;  SULFUR;  SULPHUR;  TUNGSTEN;  TUNGSTENE;  URAN;  URANIUM;  URANIUM (FRANCAIS);  VANADIUM;  VANADIUM (DEUTSCH);  VANADIUM (FRANCAIS);  WOLFRAM;  WOLFRAM (DEUTSCH);  YTTRIUM;  YTTRIUM (DEUTSCH);  YTTRIUM (FRANCAIS);  Photographic film;  Films;  Motion pictures;  Movies;  Cinema;  Feature films--History and criticism;  Moving-pictures;  Microfilms;  Filmstrips;  Film slides;  Film strips;  Slidefilms;  anodised layers;  anodized layers;  claddings;  CVD coatings;  chemical vapor deposited coatings;  chemical vapour deposited coatings;  CVD thin films;  decorative coatings;  electrophoretic coatings;  fission reactor fuel claddings;  foils;  MOCVD coatings;  optical fibre cladding;  optical fiber cladding;  protective coatings, optical fibre;  plasma arc sprayed coatings;  plasma sprayed coatings;  plasma CVD coatings;  plasma chemical vapour deposited coatings;  plasma deposited coatings;  polymer films;  polymer coatings;  vacuum deposited coatings;  vacuum deposited thin films;  vapour deposited coatings;  vapor deposited coatings;  vapor deposited thin films;  vapour deposited thin films;  ELEKTROPHORETISCHE UEBERZUEGE;  REVETEMENTS ELECTROPHORETIQUES;  PLASMALICHTBOGEN-SPRUEHUEBERZUEGE;  REVETEMENTS PAR PROJECTION AU PLASMA;  Motion Pictures (Entertainment);  有限体积法;  Art films;  Cinefilms;  Moving image materials;  Curved surfaces;  OBERFLAECHEN;  SURFACES (FRANCAIS);  lifting surfaces;  Ni;  NICKEL (DEUTSCH);  NICKEL (FRANCAIS);  nonadiabatic interaction;  相[位]
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Recommended Citation:
W. C. Ren,L. B. Gao,L. P. Ma,et al. Preparation Of Graphene By Chemical Vapor Deposition[J]. New Carbon Materials,2011,26(1):71-80.

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