Ti/TiN multilayer thin films deposited by pulse biased arc ion plating

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	Ti/TiN multilayer thin films deposited by pulse biased arc ion plating
	Y. H. Zhao; G. Q. Lin; J. Q. Xiao; H. Du; C. A. Dong; L. J. Gao
	2011
发表期刊	Applied Surface Science
ISSN	0169-4332
卷号	257 期号:7 页码:2683-2688
摘要	In this work, the effect of modulation period (A) on Ti/TiN multilayer films deposited on high-speed-steel (HSS) substrates using pulse biased arc ion plating is reported. The crystallography structures and crosssectional morphology of Ti/TiN multilayer films were characterized by X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM), respectively. Their mechanical properties were determined via nanoindentation measurements, while the film/substrate adhesion via the scratch test. It was found that the highest hardness value reached 43 GPa for the modulation period of 54 nm, while the film/substrate adhesion also reached the highest value of 83 N. Furthermore, the hardness enhancement mechanism in the multilayer films is discussed. (C) 2010 Elsevier B.V. All rights reserved.
部门归属	[zhao, yanhui] chinese acad sci, specialized mat & devices div, dept surface engn, inst met res, shenyang 110016, peoples r china. [lin, guoqiang; dong, chuang] dalian univ technol, key lab mat modificat laser ion & electron beams, minist educ, dalian 116024, peoples r china.;zhao, yh (reprint author), chinese acad sci, specialized mat & devices div, dept surface engn, inst met res, 72 wenhua rd, shenyang 110016, peoples r china;yhzhao@imr.ac.cn
关键词	Multilayer Films Pulse Biased Arc Ion Plating Hardness Adhesion Mechanical-properties Tin Films Coatings Nanoindentation Microhardness Constitution Alloy Field Dc
URL	查看原文
WOS记录号	WOS:000285963200046
引用统计	被引频次：22[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/30957
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Y. H. Zhao,G. Q. Lin,J. Q. Xiao,et al. Ti/TiN multilayer thin films deposited by pulse biased arc ion plating[J]. Applied Surface Science,2011,257(7):2683-2688.
APA	Y. H. Zhao,G. Q. Lin,J. Q. Xiao,H. Du,C. A. Dong,&L. J. Gao.(2011).Ti/TiN multilayer thin films deposited by pulse biased arc ion plating.Applied Surface Science,257(7),2683-2688.
MLA	Y. H. Zhao,et al."Ti/TiN multilayer thin films deposited by pulse biased arc ion plating".Applied Surface Science 257.7(2011):2683-2688.