| Ti/TiN multilayer thin films deposited by pulse biased arc ion plating | |
| Y. H. Zhao; G. Q. Lin; J. Q. Xiao; H. Du; C. A. Dong; L. J. Gao | |
| 2011 | |
| Source Publication | Applied Surface Science
 |
| ISSN | 0169-4332 |
| Volume | 257Issue:7Pages:2683-2688 |
| Abstract | In this work, the effect of modulation period (A) on Ti/TiN multilayer films deposited on high-speed-steel (HSS) substrates using pulse biased arc ion plating is reported. The crystallography structures and crosssectional morphology of Ti/TiN multilayer films were characterized by X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM), respectively. Their mechanical properties were determined via nanoindentation measurements, while the film/substrate adhesion via the scratch test. It was found that the highest hardness value reached 43 GPa for the modulation period of 54 nm, while the film/substrate adhesion also reached the highest value of 83 N. Furthermore, the hardness enhancement mechanism in the multilayer films is discussed. (C) 2010 Elsevier B.V. All rights reserved. |
| description.department | [zhao, yanhui] chinese acad sci, specialized mat & devices div, dept surface engn, inst met res, shenyang 110016, peoples r china. [lin, guoqiang; dong, chuang] dalian univ technol, key lab mat modificat laser ion & electron beams, minist educ, dalian 116024, peoples r china.;zhao, yh (reprint author), chinese acad sci, specialized mat & devices div, dept surface engn, inst met res, 72 wenhua rd, shenyang 110016, peoples r china;yhzhao@imr.ac.cn |
| Keyword | Multilayer Films Pulse Biased Arc Ion Plating Hardness Adhesion Mechanical-properties Tin Films Coatings Nanoindentation Microhardness Constitution Alloy Field Dc |
| URL | 查看原文 |
| WOS ID | WOS:000285963200046 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/30957 |
| Collection | 中国科学院金属研究所 |
| Recommended Citation GB/T 7714 | Y. H. Zhao,G. Q. Lin,J. Q. Xiao,et al. Ti/TiN multilayer thin films deposited by pulse biased arc ion plating[J]. Applied Surface Science,2011,257(7):2683-2688. |
| APA | Y. H. Zhao,G. Q. Lin,J. Q. Xiao,H. Du,C. A. Dong,&L. J. Gao.(2011).Ti/TiN multilayer thin films deposited by pulse biased arc ion plating.Applied Surface Science,257(7),2683-2688. |
| MLA | Y. H. Zhao,et al."Ti/TiN multilayer thin films deposited by pulse biased arc ion plating".Applied Surface Science 257.7(2011):2683-2688. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 725.pdf（454KB） | 开放获取 | -- | ||||
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment