Ti-Cu-N hard nanocomposite films prepared by pulse biased arc ion plating

IMR OpenIR

	Ti-Cu-N hard nanocomposite films prepared by pulse biased arc ion plating
	Y. H. Zhao; X. Q. Wang; J. Q. Xiao; B. H. Yu; F. Q. Li
	2011
发表期刊	Applied Surface Science
ISSN	0169-4332
卷号	258 期号:1 页码:370-376
摘要	In this work, Ti-Cu-N hard nanocomposite films were deposited on high-speed-steel (HSS) substrates using a TiCu (88: 12 at.%) single multi-component target by pulse biased arc ion plating. The influence of pulse bias voltages was examined with regard to elemental composition, structure, morphology and mechanical properties of the films. The Cu atomic content of Ti-Cu-N films was determined by Electron Probe Micro-Analyzer (EPMA). The structure and morphology were examined by X-ray diffraction (XRD) and scanning electron microscopy (SEM). Hardness and film/substrate adhesion were determined by nanoindenter and scratch test, respectively. The results showed that the content of Cu appeared to be in the range of 1.75-4.5 at.%, depending on pulse bias voltages. The films exhibit a preferred orientation TiN (1 1 1) texture when the substrate bias voltages were -100 V and -300 V, while the preferred orientation change to be a preferred orientation TiN (2 2 0) one when the substrate bias voltages increase to -600 V and -900 V. And no obvious sign of metal copper phase was observed. The SEM morphologies showed some macroparticles (MPs) on the surface of the films and the relative content of the MPs decreased significantly when the substrate bias voltages increased from -100 to -900 V. The maximum value (74 N) of the film/substrate adhesion of the films was obtained when the substrate bias voltage was -600 V with Cu content of 1.75 at.%. Hardness enhancement was observed, the value of the hardness increased firstly and reached a maximum value of 31.5 GPa, corresponding to Cu content of 1.75 at.%, and then it decreased when the substrate bias voltage changed from -100 to -900 V. The hardness enhancement was discussed related to the concept for the design of hard materials. Crown Copyright (C) 2011 Published by Elsevier B. V. All rights reserved.
部门归属	[zhao, yanhui; xiao, jinquan; yu, baohai] chinese acad sci, inst met res, shenyang 110016, peoples r china. [wang, xueqi; li, fengqi] shenyang ligong univ, shenyang 110168, peoples r china.;zhao, yh (reprint author), chinese acad sci, inst met res, shenyang 110016, peoples r china;yhzhao@imr.ac.cn
关键词	Pulse Biased Arc Ion Plating Nanocomposite Films Ti-cu-n Hardness Mechanical-properties Superhard Materials Coatings Deposition Dc Microstructure Bombardment Morphology Titanium Design
URL	查看原文
WOS记录号	WOS:000296492500061
引用统计	被引频次：34[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/30959
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Y. H. Zhao,X. Q. Wang,J. Q. Xiao,et al. Ti-Cu-N hard nanocomposite films prepared by pulse biased arc ion plating[J]. Applied Surface Science,2011,258(1):370-376.
APA	Y. H. Zhao,X. Q. Wang,J. Q. Xiao,B. H. Yu,&F. Q. Li.(2011).Ti-Cu-N hard nanocomposite films prepared by pulse biased arc ion plating.Applied Surface Science,258(1),370-376.
MLA	Y. H. Zhao,et al."Ti-Cu-N hard nanocomposite films prepared by pulse biased arc ion plating".Applied Surface Science 258.1(2011):370-376.