TiN/TiC multilayer films deposited by pulse biased arc ion plating

IMR OpenIR

	TiN/TiC multilayer films deposited by pulse biased arc ion plating
	Y. H. Zhao; G. Q. Lin; J. Q. Xiao; C. A. Dong; L. S. Wen
	2010
发表期刊	Vacuum
ISSN	0042-207X
卷号	85 期号:1 页码:40912
摘要	TiN/TiC multilayer films were deposited on high-speed-steel (HSS) substrates using pulse biased arc ion plating. For comparison, TiN and TIC films were also deposited. Scanning electron microscopy (SEM), X-ray diffraction (XRD) and Auger electron spectroscopy (AES) were applied to investigate the modulation period thickness, microstructure and content depth distribution of the films, respectively. And microhardness and film/substrate adhesion were also analyzed using knoop tester and scratching method. The results showed that the multilayer films with different modulation period of 40-240 nm exhibit a modulation structure and the interface width is about 20 similar to 30 nm. Microhardness of the multilayer films were not obviously improved compared to that of TiN and TIC film, and the reason was analyzed. In comparison to TIN film, film/substrate adhesion values of the multilayer films were deteriorated with the increasing of modulation period due to the brittle characteristics of TIC film. (C) 2009 Published by Elsevier Ltd.
部门归属	[zhao, yanhui; xiao, jinquan; wen, lishi] chinese acad sci, inst met res, shenyang 110016, peoples r china. [lin, guoqiang; dong, chuang] dalian univ technol, state key lab mat modificat laser ion & electron, dalian 116024, peoples r china.;wen, ls (reprint author), chinese acad sci, inst met res, shenyang 110016, peoples r china;lswen@imr.ac.cn
关键词	Tin/tic Multilayer Films Pulse Biased Arc Ion Plating Microhardness Film/substrate Adhesion Mechanical-properties Hard Coatings Behavior Systems Design Steel
URL	查看原文
WOS记录号	WOS:000282077000001
引用统计	被引频次：28[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/31752
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Y. H. Zhao,G. Q. Lin,J. Q. Xiao,et al. TiN/TiC multilayer films deposited by pulse biased arc ion plating[J]. Vacuum,2010,85(1):40912.
APA	Y. H. Zhao,G. Q. Lin,J. Q. Xiao,C. A. Dong,&L. S. Wen.(2010).TiN/TiC multilayer films deposited by pulse biased arc ion plating.Vacuum,85(1),40912.
MLA	Y. H. Zhao,et al."TiN/TiC multilayer films deposited by pulse biased arc ion plating".Vacuum 85.1(2010):40912.