| Electrochemical behaviour of microcrystalline aluminium in neutral fluoride containing solutions; Electrochemical behaviour of microcrystalline aluminium in neutral fluoride containing solutions | |
| B. Zhang; Y. Li; F. H. Wang | |
| 2009 ; 2009 | |
| Source Publication | Corrosion Science
 ; Corrosion Science
|
| ISSN | 0010-938X ; 0010-938X |
| Volume | 51Issue:2Pages:268-275 |
| Abstract | The electrochemical behaviour of microcrystalline pure aluminium coating (mc-Al), fabricated by a magnetron sputtering technique, has been investigated in NaF as well as NaF + NaCl aqueous solutions. Results indicate that the anodic polarization characteristic changes with NaF concentration. F(-) anions promote the formation of a passive film, whose semiconducting properties were investigated. When the F(-) concentration is high ([F(-)] >= 0.03 mol/L) the passive film is mainly composed of aluminium fluoride, which is an n-type semiconductor on mc-Al and a p-type semiconductor on polycrystalline Al (pc-Al). In NaF + NaCl aqueous solutions, Cl(-) and F(-) ions compete in affecting the type of semiconducting passive films formed on mc-Al. (C) 2008 Elsevier Ltd. All rights reserved.; The electrochemical behaviour of microcrystalline pure aluminium coating (mc-Al), fabricated by a magnetron sputtering technique, has been investigated in NaF as well as NaF + NaCl aqueous solutions. Results indicate that the anodic polarization characteristic changes with NaF concentration. F(-) anions promote the formation of a passive film, whose semiconducting properties were investigated. When the F(-) concentration is high ([F(-)] >= 0.03 mol/L) the passive film is mainly composed of aluminium fluoride, which is an n-type semiconductor on mc-Al and a p-type semiconductor on polycrystalline Al (pc-Al). In NaF + NaCl aqueous solutions, Cl(-) and F(-) ions compete in affecting the type of semiconducting passive films formed on mc-Al. (C) 2008 Elsevier Ltd. All rights reserved. |
| description.department | [zhang, bo; li, ying; wang, fuhui] chinese acad sci, inst met res, state key lab corros & protect, shenyang 110062, peoples r china.;li, y (reprint author), chinese acad sci, inst met res, state key lab corros & protect, wencui rd 62, shenyang 110062, peoples r china, peoples r china;liying@imr.ac.cn ; [zhang, bo; li, ying; wang, fuhui] chinese acad sci, inst met res, state key lab corros & protect, shenyang 110062, peoples r china.;li, y (reprint author), chinese acad sci, inst met res, state key lab corros & protect, wencui rd 62, shenyang 110062, peoples r china, peoples r china;liying@imr.ac.cn |
| Keyword | Aluminium Aluminium Sputtered Films Sputtered Films Passive Films Passive Films Pitting Corrosion Pitting Corrosion Crevice Corrosion Crevice Corrosion Pit Initiation Pit Initiation Noise-analysis Noise-analysis Pure Aluminum Pure Aluminum Chloride Chloride Sulfate Sulfate Alloy Alloy Ions Ions Susceptibility Susceptibility |
| URL | 查看原文 ; 查看原文 |
| WOS ID | WOS:000263584700009 ; WOS:000263584700009 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/32523 |
| Collection | 中国科学院金属研究所 |
| Recommended Citation GB/T 7714 | B. Zhang,Y. Li,F. H. Wang. Electrochemical behaviour of microcrystalline aluminium in neutral fluoride containing solutions, Electrochemical behaviour of microcrystalline aluminium in neutral fluoride containing solutions[J]. Corrosion Science, Corrosion Science,2009, 2009,51, 51(2):268-275, 268-275. |
| APA | B. Zhang,Y. Li,&F. H. Wang.(2009).Electrochemical behaviour of microcrystalline aluminium in neutral fluoride containing solutions.Corrosion Science,51(2),268-275. |
| MLA | B. Zhang,et al."Electrochemical behaviour of microcrystalline aluminium in neutral fluoride containing solutions".Corrosion Science 51.2(2009):268-275. |
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