Effects of power density and post annealing process on the microstructure and wettability of TiO2 films deposited by mid-frequency-magnetron reactive sputtering

IMR OpenIR

	Effects of power density and post annealing process on the microstructure and wettability of TiO2 films deposited by mid-frequency-magnetron reactive sputtering
	Y. Cui; H. Du; J. Q. Xiao; L. Wen
	2008
发表期刊	Journal of Materials Science & Technology
ISSN	1005-0302
卷号	24 期号:2 页码:172-178
摘要	The relationship of "preparation parameters-microstructures-wettability" of TiO2 films was reported. In this work, TiO2 films were deposited onto glass and silicon substrates by using mid-frequency dual magnetron sputtering technique at ambient temperature with various power densities and deposition time. After deposition, the films were heat treated at different annealing temperatures. X-ray diffraction (XRD), Raman spectroscopy, and field-emission scanning electron microscopy (FE-SEM) were utilized to characterize TiO2 films. The wettability of the films was evaluated by water contact angle measurement. The phase transition temperature of TiO2 films depended on the power density. It was demonstrated that wettability was strongly structure dependent and the film with the thickness of 610 nm (the power density was 2.22 W/cm(2)) showed the lowest contact angle (8). It can be concluded that smaller crystallite size, the rutile phase with (110) face being parallel to the surface, and tensile stress favored the hydrophilicity of the TiO2 films.
部门归属	[cui, ying; du, hao; xiao, jinquan; wen, lishi] chinese acad sci, inst met res, div surface engn mat, shenyang 110016, peoples r china. [cui, ying] chinese acad sci, grad sch, beijing 100039, peoples r china.;wen, l (reprint author), chinese acad sci, inst met res, div surface engn mat, shenyang 110016, peoples r china;lswen@imr.ac.cn
关键词	Titanium Dioxide Reactive Magnetron Sputtering Phase Composition Microstructure Hydrophilicity Thin-films Titanium-dioxide Photoinduced Hydrophilicity Surfaces Anatase Conversion Photocatalysis Enhancement Electrode Stress
URL	查看原文
WOS记录号	WOS:000254637200007
引用统计	被引频次：3[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/32705
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Y. Cui,H. Du,J. Q. Xiao,et al. Effects of power density and post annealing process on the microstructure and wettability of TiO2 films deposited by mid-frequency-magnetron reactive sputtering[J]. Journal of Materials Science & Technology,2008,24(2):172-178.
APA	Y. Cui,H. Du,J. Q. Xiao,&L. Wen.(2008).Effects of power density and post annealing process on the microstructure and wettability of TiO2 films deposited by mid-frequency-magnetron reactive sputtering.Journal of Materials Science & Technology,24(2),172-178.
MLA	Y. Cui,et al."Effects of power density and post annealing process on the microstructure and wettability of TiO2 films deposited by mid-frequency-magnetron reactive sputtering".Journal of Materials Science & Technology 24.2(2008):172-178.