Influence of N-2 gas pressure and negative bias voltage on the microstructure and properties of Cr-Si-N films by a hybrid coating system

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	Influence of N-2 gas pressure and negative bias voltage on the microstructure and properties of Cr-Si-N films by a hybrid coating system
	Q. M. Wang; I. W. Park; K. Kim
	2008
发表期刊	Journal of Vacuum Science & Technology A
ISSN	0734-2101
卷号	26 期号:5 页码:1188-1194
摘要	Cr-Si-N films were deposited using a hybrid coating system combining arc ion plating and magnetron sputtering. The authors investigated the influence of N-2 flux rate and negative bias voltage on the microstructure and properties of Cr-Si-N films, e. g., chemical composition, film morphology, phase structure, residual stress, and microhardness. The results showed that all the Cr-Si-N films were close to stoichiometry. The N-2 flux rate had no important influence on the microstructure and properties of the Cr-Si-N films. Applying a negative bias voltage resulted in significant decrease in macroparticle densities and smoother film surface. Also the film microstructure transformed from apparent columnar to nanocomposite microstructure. The maximum microhardness obtained ranged from 45 to 50 GPa at a bias voltage ranging from -50 to -100 V. The microhardness enhancement could be ascribed to the mixed effect of grain size diminishment and residual compressive stress. (c) 2008 American Vacuum Society.
部门归属	[wang, qimin; park, in-wook; kim, kwangho] pusan natl univ, natl core res ctr hybrid mat solut, pusan 609735, south korea. [wang, qimin] inst met sci & technol, div surface engn mat, shenyang 11016, peoples r china.;kim, k (reprint author), pusan natl univ, natl core res ctr hybrid mat solut, pusan 609735, south korea;kwhokim@pusan.ac.kr
关键词	Cathodic Arc Plasma Mechanical-properties Sputtering Techniques Substrate Bias Nanocomposite Films Ion-bombardment Thin-films Deposition Temperature Hardness
URL	查看原文
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/33146
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Q. M. Wang,I. W. Park,K. Kim. Influence of N-2 gas pressure and negative bias voltage on the microstructure and properties of Cr-Si-N films by a hybrid coating system[J]. Journal of Vacuum Science & Technology A,2008,26(5):1188-1194.
APA	Q. M. Wang,I. W. Park,&K. Kim.(2008).Influence of N-2 gas pressure and negative bias voltage on the microstructure and properties of Cr-Si-N films by a hybrid coating system.Journal of Vacuum Science & Technology A,26(5),1188-1194.
MLA	Q. M. Wang,et al."Influence of N-2 gas pressure and negative bias voltage on the microstructure and properties of Cr-Si-N films by a hybrid coating system".Journal of Vacuum Science & Technology A 26.5(2008):1188-1194.