Pulsed laser deposition of WO3-base film for NO2 gas sensor application

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	Pulsed laser deposition of WO3-base film for NO2 gas sensor application
	Y. Zhao; Z. C. Feng; Y. Liang
	2000
发表期刊	Sensors and Actuators B-Chemical
ISSN	0925-4005
卷号	66 期号:1-3 页码:171-173
摘要	Pulsed laser deposition (PLD) technique was used to deposit Al- and Ti-doped WO3 films. Only under certain circumstances, did the stoichiometry of the targets compile with the films. The as-deposited films of the doped WO3 were half-crystallized triclinic WO3. After being annealed at 500 degrees C for 2 hours, tetragonal structure of WO2.90 was formed. Due to the much smaller crystallites in the films of WO2.90, the Al and Ti dopant greatly improved the sensitivity of the films to NO2. (C) 2000 Elsevier Science S.A. All rights reserved.
部门归属	chinese acad sci, inst met res, shenyang 10015, peoples r china.;zhao, y (reprint author), chinese acad sci, inst met res, shenyang 10015, peoples r china
关键词	Pulsed Laser Deposition Wo3 No2 Gas Sensor Tungsten
URL	查看原文
WOS记录号	WOS:000088378500053
引用统计	被引频次：57[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/37274
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	Y. Zhao,Z. C. Feng,Y. Liang. Pulsed laser deposition of WO3-base film for NO2 gas sensor application[J]. Sensors and Actuators B-Chemical,2000,66(1-3):171-173.
APA	Y. Zhao,Z. C. Feng,&Y. Liang.(2000).Pulsed laser deposition of WO3-base film for NO2 gas sensor application.Sensors and Actuators B-Chemical,66(1-3),171-173.
MLA	Y. Zhao,et al."Pulsed laser deposition of WO3-base film for NO2 gas sensor application".Sensors and Actuators B-Chemical 66.1-3(2000):171-173.