Ti films were deposited on liquid nitrogen-cooled substrates by ion-beam sputtering. The X-ray diffraction pattern of the as-deposited Ti films clearly shows Ti amorphous diffused scattering maxima. The image of the Ti films was observed by high-resolution electron microscopy and the electron diffraction pattern of the film demonstrates again the amorphous structure by its diffused halo. Energy dispersive analysis of X-ray and Auger depth profiling were used to examine the ingredients of the film. The results show that the film can be considered as Ti amorphous film. (C) 1997 Elsevier Science S.A.
部门归属
chinese acad sci,int ctr mat phys,shenyang 110015,peoples r china.;yu, rc (reprint author), chinese acad sci,inst phys,pob 603,beijing 100080,peoples r china
R. C. Yu,W. K. Wang. Formation of Ti amorphous films deposited on liquid nitrogen-cooled substrates by ion-beam sputtering[J]. Thin Solid Films,1997,302(1-2):108-110.
APA
R. C. Yu,&W. K. Wang.(1997).Formation of Ti amorphous films deposited on liquid nitrogen-cooled substrates by ion-beam sputtering.Thin Solid Films,302(1-2),108-110.
MLA
R. C. Yu,et al."Formation of Ti amorphous films deposited on liquid nitrogen-cooled substrates by ion-beam sputtering".Thin Solid Films 302.1-2(1997):108-110.
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