FRACTON-ELECTRON INTERACTION - A POSSIBLE ORIGIN OF THE RESISTIVITY MINIMA AT LOW-TEMPERATURES IN METALLIC GLASSES

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	FRACTON-ELECTRON INTERACTION - A POSSIBLE ORIGIN OF THE RESISTIVITY MINIMA AT LOW-TEMPERATURES IN METALLIC GLASSES
	D. C. Tian; J. X. Li; Z. H. Zhang
	1992
发表期刊	Physical Review B
ISSN	0163-1829
卷号	45 期号:14 页码:8116-8119
摘要	We calculate the temperature dependence of resistivity to second order of the interaction between the conduction electrons (extended) and fractons (excitations in a fractal lattice). The result shows that the resistivity rho varies as [1n(HBAr-omega(F)/kT-HBAR-omega(c))]2 (omega(F) the fraction Debye frequency and omega(c) the phonon-fraction crossover frequency). It is demonstrated that resistivity minima at low temperatures in weak-scattering metallic glasses might be due to a competition between negative temperature coefficients of resistivity (TCR's) resulting from the electron-fracton interaction and a positive TCR from the regular electron-phonon interaction.
部门归属	acad sinica,int ctr mat phys,shenyang 110015,peoples r china.;tian, dc (reprint author), wuhan univ,dept phys,wuhan 430072,peoples r china
关键词	Disordered-systems Thermal-conductivity Percolation Clusters Amorphous Materials Nonradiative Decay Alloys Resistance Relaxation States
URL	查看原文
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/39296
专题	中国科学院金属研究所
推荐引用方式 GB/T 7714	D. C. Tian,J. X. Li,Z. H. Zhang. FRACTON-ELECTRON INTERACTION - A POSSIBLE ORIGIN OF THE RESISTIVITY MINIMA AT LOW-TEMPERATURES IN METALLIC GLASSES[J]. Physical Review B,1992,45(14):8116-8119.
APA	D. C. Tian,J. X. Li,&Z. H. Zhang.(1992).FRACTON-ELECTRON INTERACTION - A POSSIBLE ORIGIN OF THE RESISTIVITY MINIMA AT LOW-TEMPERATURES IN METALLIC GLASSES.Physical Review B,45(14),8116-8119.
MLA	D. C. Tian,et al."FRACTON-ELECTRON INTERACTION - A POSSIBLE ORIGIN OF THE RESISTIVITY MINIMA AT LOW-TEMPERATURES IN METALLIC GLASSES".Physical Review B 45.14(1992):8116-8119.