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Mechanical behavior related to various bonding states in amorphous Si-C-N hard films
C. Q.; Schlemper Zhuang, C.; Fuchs, R.; Zhang, L.; Huang, N.; Vogel, M.; Staedler, T.; Jiang, X.
2014
发表期刊Surface & Coatings Technology
ISSN0257-8972
卷号258页码:353-358
摘要A series of amorphous Si-C-N hard films were prepared by an electron cyclotron resonance chemical vapor deposition method. Microstructure characterization revealed that amorphous Si-C-N hard films contained various bonding states. Among them, Si- N and Si- C bonds played a leading role in determining the microstructure of amorphous Si-C-N hard films. Mechanical measurements showed that the hardness of these films varied between 17 GPa and 28 GPa as a function of the tetramethylsilane flow rate. A close relation between various bonding states and hardness was found. The variation of hardness was dominated by the bond fraction that corresponded to various bonding states. Macroscopic mechanical properties of a material were illustrated from the perspective of microscopic structural characterization. (C) 2014 Elsevier B.V. All rights reserved.
部门归属[zhuang, chunqiang] beijing univ technol, inst microstruct & properties adv mat, beijing 100124, peoples r china. [zhuang, chunqiang ; schlemper, christoph ; fuchs, regina ; zhang, lei ; vogel, michael ; staedler, thorsten ; jiang, xin] univ siegen, inst mat engn, d-57076 siegen, germany. [zhang, lei] forschungszentrum julich, inst microstruct res, ernst ruska ctr er c microscopy & spect electron, d-52425 julich, germany. [huang, nan] chinese acad sci, inst met res, shenyang natl lab mat sci, shenyang 110016, peoples r china. ; zhuang, cq (reprint author), beijing univ technol, inst microstruct & properties adv mat, beijing 100124, peoples r china. ; chunqiang.zhuang@bjut.edu.cn
关键词Si-c-n Coatings Chemical Bond Mechanical Behavior Silicon Carbonitride Films Pulsed-laser Deposition Chemical-vapor-deposition Nitride Thin-films Optical-properties Surface-morphology Band-gap Alloys Microstructure Coatings
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文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/74046
专题中国科学院金属研究所
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C. Q.,Schlemper Zhuang, C.,Fuchs, R.,et al. Mechanical behavior related to various bonding states in amorphous Si-C-N hard films[J]. Surface & Coatings Technology,2014,258:353-358.
APA C. Q..,Schlemper Zhuang, C..,Fuchs, R..,Zhang, L..,Huang, N..,...&Jiang, X..(2014).Mechanical behavior related to various bonding states in amorphous Si-C-N hard films.Surface & Coatings Technology,258,353-358.
MLA C. Q.,et al."Mechanical behavior related to various bonding states in amorphous Si-C-N hard films".Surface & Coatings Technology 258(2014):353-358.
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