Effect of doping SiO2 and applying high magnetic field during the film growth on structure and magnetic properties of evaporated Fe films

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	Effect of doping SiO2 and applying high magnetic field during the film growth on structure and magnetic properties of evaporated Fe films
	Liu, SY; Ma, YH; Chang, L; Li, GJ; Wang, JH; Wang, Q; Li, GJ (reprint author), Northeastern Univ, Minist Educ, Key Lab Electromagnet Proc Mat, Shenyang 110819, Liaoning, Peoples R China.
	2018-04-01
发表期刊	THIN SOLID FILMS
ISSN	0040-6090
卷号	651 页码:1-6
摘要	Huge difference of surface energies between dielectric and metal provides an effective method to tune the structure and magnetic properties of films. Due to the difference of surface energies between SiO2 and Fe, dopant of SiO2 with 3.6% in atomic ratio in Fe film transforms the strip and column structure in the Fe films to equiaxed crystal formed by nanoparticles of the Fe-SiO2 films. Zeeman energy of applying high magnetic field (HMF) during film growth increases Fe atomic aggregation and atomic diffusion of SiO2 into the grain boundary. This leads to the improvement of the particle size with applying HMF during the film growth. These structural evolutions have a significant effect on the performance of the films. After the dopant of SiO2, the saturation magnetization M-s of the Fe-SiO2 film (324.6 kA/m) is 73.2% less than that of the Fe films. The coercivity H-c decreases 204.0% to 788.04 A/m. However, the Ms increases 44.3% and the H-c increases 27.4% for the Fe-SiO2 film with applying HMF during the film growth.; Huge difference of surface energies between dielectric and metal provides an effective method to tune the structure and magnetic properties of films. Due to the difference of surface energies between SiO2 and Fe, dopant of SiO2 with 3.6% in atomic ratio in Fe film transforms the strip and column structure in the Fe films to equiaxed crystal formed by nanoparticles of the Fe-SiO2 films. Zeeman energy of applying high magnetic field (HMF) during film growth increases Fe atomic aggregation and atomic diffusion of SiO2 into the grain boundary. This leads to the improvement of the particle size with applying HMF during the film growth. These structural evolutions have a significant effect on the performance of the films. After the dopant of SiO2, the saturation magnetization M-s of the Fe-SiO2 film (324.6 kA/m) is 73.2% less than that of the Fe films. The coercivity H-c decreases 204.0% to 788.04 A/m. However, the Ms increases 44.3% and the H-c increases 27.4% for the Fe-SiO2 film with applying HMF during the film growth.
部门归属	[liu, shiying ; ma, yonghui ; chang, ling ; li, guojian ; wang, jianhao ; wang, qiang] northeastern univ, minist educ, key lab electromagnet proc mat, shenyang 110819, liaoning, peoples r china ; [ma, yonghui] chinese acad sci, inst met res, shenyang 110016, liaoning, peoples r china
关键词	Tunneling Giant Magnetoresistance Fe-sio2 Granular Films Nanoparticles
学科领域	Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
资助者	National Natural Science Foundation of China [51425401]; Fundamental Research Funds for the Central Universities [N160905001, N160907001]
收录类别	SCI
语种	英语
WOS记录号	WOS:000427525400001
引用统计	被引频次：13[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/79408
专题	中国科学院金属研究所
通讯作者	Li, GJ (reprint author), Northeastern Univ, Minist Educ, Key Lab Electromagnet Proc Mat, Shenyang 110819, Liaoning, Peoples R China.
推荐引用方式 GB/T 7714	Liu, SY,Ma, YH,Chang, L,et al. Effect of doping SiO2 and applying high magnetic field during the film growth on structure and magnetic properties of evaporated Fe films[J]. THIN SOLID FILMS,2018,651:1-6.
APA	Liu, SY.,Ma, YH.,Chang, L.,Li, GJ.,Wang, JH.,...&Li, GJ .(2018).Effect of doping SiO2 and applying high magnetic field during the film growth on structure and magnetic properties of evaporated Fe films.THIN SOLID FILMS,651,1-6.
MLA	Liu, SY,et al."Effect of doping SiO2 and applying high magnetic field during the film growth on structure and magnetic properties of evaporated Fe films".THIN SOLID FILMS 651(2018):1-6.