Study of defects and electron densities in TiAl alloy doped with V and Ag by positron annihilation

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	Study of defects and electron densities in TiAl alloy doped with V and Ag by positron annihilation
	Deng, W ; Zhu, YY ; Zhou, YN ; Huang, YY ; Cao, MZ ; Xiong, LY
通讯作者	Deng, W()
	2006-03-01
发表期刊	RARE METAL MATERIALS AND ENGINEERING
ISSN	1002-185X
卷号	35 期号:3 页码:348-351
摘要	Positron lifetime spectra of Ti50Al50, Ti50Al48V2, Ti50Al48Ag2 alloys and annealed Ti, Al, Ag, V metals were measured. The electron densities in the bulk and defects of the alloys were calculated by positron lifetime parameters. The poor ductility of binary TiAl alloy is related to low free electron densities in the bulk and the grain boundaries of the alloy. When V are added into Ti-rich TiAl alloy, V atoms will provide more free electrons than both Al and Ti atoms to participate in metallic bonds, thus increasing the electron densities in the bulk and the grain boundary simultaneously. Ag additions appear to have an effect similar to V additions. Both V and Ag are benefit elements in enhancing the ductility of TiAl alloys.
关键词	TiAl alloy electron density microdefect positron annihilation
收录类别	SCI
语种	英语
WOS研究方向	Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目	Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000236600300004
出版者	NORTHWEST INST NONFERROUS METAL RESEARCH
引用统计	被引频次：2[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/88468
专题	中国科学院金属研究所
通讯作者	Deng, W
作者单位	1.Guangxi Univ, Dept Phys, Nanning 530004, Peoples R China 2.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China 3.Chinese Acad Sci, Int Ctr Mat Phys, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Deng, W,Zhu, YY,Zhou, YN,et al. Study of defects and electron densities in TiAl alloy doped with V and Ag by positron annihilation[J]. RARE METAL MATERIALS AND ENGINEERING,2006,35(3):348-351.
APA	Deng, W,Zhu, YY,Zhou, YN,Huang, YY,Cao, MZ,&Xiong, LY.(2006).Study of defects and electron densities in TiAl alloy doped with V and Ag by positron annihilation.RARE METAL MATERIALS AND ENGINEERING,35(3),348-351.
MLA	Deng, W,et al."Study of defects and electron densities in TiAl alloy doped with V and Ag by positron annihilation".RARE METAL MATERIALS AND ENGINEERING 35.3(2006):348-351.