Cathodic electro-deposition of WO3 and its photoelectrochemical anticorrosion for copper under visible light

IMR OpenIR

	Cathodic electro-deposition of WO3 and its photoelectrochemical anticorrosion for copper under visible light
	Leng Wenhua ; Liu Dongpo ; Cheng Xiaofang ; Zhu Wencai ; Zhang Jianqing ; Cao Chunan
通讯作者	Leng Wenhua(lengwh@css.zju.edu.cn)
	2007-07-01
发表期刊	ACTA METALLURGICA SINICA
ISSN	0412-1961
卷号	43 期号:7 页码:764-768
摘要	WO3 film electrode with visible photoresponse was prepared by cathodic electrodeposition, in order to develop a photoelectrochemical approach for metal, such as copper, anticorrosion under visible light illumination. The influences of preparation conditions and the composition in anode compartment on its photoelectrochemical performance were investigated. The results show that the optimal preparation conditions are: electrodeposition potential at -0.45 V vs. saturated calomel electrode, deposit time 1600 s, sintered at 400 degrees C. In the presence of hole scavenger, such as formate, the photocurrent of the photoelectrode was the highest, and it increased with increasing pH and formate concentration in the anode cell. The photoelectrochemical approach for copper anti corrosion in 4 mol/dm(3) NaCl solution using the WO3 photoanode under visible light was proved to be practicable, which provides a new approach for photoelectrochemical anticorrosion for metals under visible light.
关键词	WO3 electrodeposition visible light copper photoelectrochemical anticorrosion
收录类别	SCI
语种	英语
WOS研究方向	Metallurgy & Metallurgical Engineering
WOS类目	Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000248548200018
出版者	SCIENCE PRESS
引用统计	被引频次：4[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/91604
专题	中国科学院金属研究所
通讯作者	Leng Wenhua
作者单位	1.Zhejiang Univ, Dept Chem, Hangzhou 310027, Peoples R China 2.Coll Educ Shandong, Dept Chem & Chem Engn, Jinan 250013, Peoples R China 3.Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect, Shenyang 110016, Peoples R China
推荐引用方式 GB/T 7714	Leng Wenhua,Liu Dongpo,Cheng Xiaofang,et al. Cathodic electro-deposition of WO3 and its photoelectrochemical anticorrosion for copper under visible light[J]. ACTA METALLURGICA SINICA,2007,43(7):764-768.
APA	Leng Wenhua,Liu Dongpo,Cheng Xiaofang,Zhu Wencai,Zhang Jianqing,&Cao Chunan.(2007).Cathodic electro-deposition of WO3 and its photoelectrochemical anticorrosion for copper under visible light.ACTA METALLURGICA SINICA,43(7),764-768.
MLA	Leng Wenhua,et al."Cathodic electro-deposition of WO3 and its photoelectrochemical anticorrosion for copper under visible light".ACTA METALLURGICA SINICA 43.7(2007):764-768.