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Preparation and thermal desorption properties of dc sputtered zirconium-hydrogen-helium thin films
Wei, Y. C.1; Shi, L. Q.1; Zhang, L.1; He, Z. J.1; Zhang, B.1; Wang, L. B.2
通讯作者Shi, L. Q.(lqshi@fudan.edu.cn)
2008-11-01
发表期刊JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
ISSN0734-2101
卷号26期号:6页码:1511-1518
摘要We developed a new approach for preparing hydrogen and helium co-containing zirconium films (Zr-H-He) to simulate aging metal tritides. We also studied the effect of hydrogen on helium behavior, in which we applied direct current magnetron sputtering in a mixture of working gases (helium, argon, and hydrogen). The amount and depth profile of helium and hydrogen trapped in the films were determined using the elastic recoil detection analysis. The microstructure and surface morphology of the Zr-H-He films were studied by x-ray diffraction, transmission electron microscopy, and atomic force microscopy. To investigate the effect of hydrogen on the thermal release behavior of helium in the Zr film, thermal desorption spectrometry (TDS) was used, which revealed a similar desorption behavior to aged tritides. TDS experiments showed that the spectra were constituted by low-temperature peaks around 300 degrees C and high temperature peaks above 750 degrees C. Furthermore, the solid-phase alpha to delta transformation changed the shapes of the high-temperature peaks related to microstates of helium bubbles and caused the peak with a massive helium release shift toward lower temperature obviously.
关键词crystal microstructure desorption sputter deposition surface morphology thin films transmission electron microscopy X-ray diffraction zirconium compounds
资助者National Natural Science Foundation of China ; Shanghai Leading Academic
DOI10.1116/1.2990852
收录类别SCI
语种英语
资助项目National Natural Science Foundation of China[10675034] ; National Natural Science Foundation of China[50471078] ; Shanghai Leading Academic[B107]
WOS研究方向Materials Science ; Physics
WOS类目Materials Science, Coatings & Films ; Physics, Applied
WOS记录号WOS:000260777100021
出版者A V S AMER INST PHYSICS
引用统计
被引频次:2[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/92850
专题中国科学院金属研究所
通讯作者Shi, L. Q.
作者单位1.Fudan Univ, Inst Modern Phys, Appl Ion Beam Phys Lab, Shanghai 20043, Peoples R China
2.Chinese Acad Sci, Inst Met Phys, Shenyang 110016, Peoples R China
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Wei, Y. C.,Shi, L. Q.,Zhang, L.,et al. Preparation and thermal desorption properties of dc sputtered zirconium-hydrogen-helium thin films[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2008,26(6):1511-1518.
APA Wei, Y. C.,Shi, L. Q.,Zhang, L.,He, Z. J.,Zhang, B.,&Wang, L. B..(2008).Preparation and thermal desorption properties of dc sputtered zirconium-hydrogen-helium thin films.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,26(6),1511-1518.
MLA Wei, Y. C.,et al."Preparation and thermal desorption properties of dc sputtered zirconium-hydrogen-helium thin films".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 26.6(2008):1511-1518.
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