| Electrochemical characteristics of La-Ni-Al thin films | |
| Li, Chi Ying Vanessa1; Wang, Zhong Min2; Liu, Shi3; Chan, Sammy Lap Ip1 | |
| Corresponding Author | Chan, Sammy Lap Ip(sli.chan@unsw.edu.au) |
| 2008-05-29 | |
| Source Publication | JOURNAL OF ALLOYS AND COMPOUNDS
 |
| ISSN | 0925-8388 |
| Volume | 456Issue:1-2Pages:407-412 |
| Abstract | AB(5) based hydrogen storage thin films (LaNi4.25Al0.75), deposited on Cu substrate by dc magnetron sputtering, have been investigated in this paper. X-ray diffraction (XRD) revealed that the microstructure of the film was in crystal form. SEM, AFM and FIB analyses proved that on the surface there were many pores of approximately 15-40 nm in diameter of random size. The cross section of the film revealed that it was rather dense and defect-free, with a uniform thickness of about 4.2 mu m. Electrochemical properties of the films were measured by simulated battery tests. The single layer LaNi4.25Al0.75 film undergoes a longer activation period than typical AB5 alloys in bulk and the maximum discharge capacity of the film was about 220 mAh/g. Two electrochemical behaviour (distinct to the bulk materials) were observed for the film electrode in which there was an apparent increase in intermediate potential for each discharge process, as well as a local increase of discharge potential during its activation period. (c) 2007 Elsevier B.V. All rights reserved. |
| Keyword | thin films magnetron sputtering hydrogen storage electrochemical properties discharge capacity |
| DOI | 10.1016/j.jallcom.2007.02.058 |
| Indexed By | SCI |
| Language | 英语 |
| WOS Research Area | Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering |
| WOS Subject | Chemistry, Physical ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering |
| WOS ID | WOS:000255510900070 |
| Publisher | ELSEVIER SCIENCE SA |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/95336 |
| Collection | 中国科学院金属研究所 |
| Corresponding Author | Chan, Sammy Lap Ip |
| Affiliation | 1.Univ New S Wales, Sch Mat Sci & Engn, Sydney, NSW 2052, Australia 2.Guilin Univ Elect Technol, Ctr Mat Sci & Engn, Guilin 541004, Guangxi, Peoples R China 3.Chinese Acad Sci, Inst Met Res, Beijing 100864, Peoples R China |
| Recommended Citation GB/T 7714 | Li, Chi Ying Vanessa,Wang, Zhong Min,Liu, Shi,et al. Electrochemical characteristics of La-Ni-Al thin films[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2008,456(1-2):407-412. |
| APA | Li, Chi Ying Vanessa,Wang, Zhong Min,Liu, Shi,&Chan, Sammy Lap Ip.(2008).Electrochemical characteristics of La-Ni-Al thin films.JOURNAL OF ALLOYS AND COMPOUNDS,456(1-2),407-412. |
| MLA | Li, Chi Ying Vanessa,et al."Electrochemical characteristics of La-Ni-Al thin films".JOURNAL OF ALLOYS AND COMPOUNDS 456.1-2(2008):407-412. |
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