Electrochemical characteristics of La-Ni-Al thin films

doi:10.1016/j.jallcom.2007.02.058

IMR OpenIR

	Electrochemical characteristics of La-Ni-Al thin films
	Li, Chi Ying Vanessa 1; Wang, Zhong Min 2; Liu, Shi 3; Chan, Sammy Lap Ip 1
通讯作者	Chan, Sammy Lap Ip(sli.chan@unsw.edu.au)
	2008-05-29
发表期刊	JOURNAL OF ALLOYS AND COMPOUNDS
ISSN	0925-8388
卷号	456 期号:1-2 页码:407-412
摘要	AB(5) based hydrogen storage thin films (LaNi4.25Al0.75), deposited on Cu substrate by dc magnetron sputtering, have been investigated in this paper. X-ray diffraction (XRD) revealed that the microstructure of the film was in crystal form. SEM, AFM and FIB analyses proved that on the surface there were many pores of approximately 15-40 nm in diameter of random size. The cross section of the film revealed that it was rather dense and defect-free, with a uniform thickness of about 4.2 mu m. Electrochemical properties of the films were measured by simulated battery tests. The single layer LaNi4.25Al0.75 film undergoes a longer activation period than typical AB5 alloys in bulk and the maximum discharge capacity of the film was about 220 mAh/g. Two electrochemical behaviour (distinct to the bulk materials) were observed for the film electrode in which there was an apparent increase in intermediate potential for each discharge process, as well as a local increase of discharge potential during its activation period. (c) 2007 Elsevier B.V. All rights reserved.
关键词	thin films magnetron sputtering hydrogen storage electrochemical properties discharge capacity
DOI	10.1016/j.jallcom.2007.02.058
收录类别	SCI
语种	英语
WOS研究方向	Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目	Chemistry, Physical ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS记录号	WOS:000255510900070
出版者	ELSEVIER SCIENCE SA
引用统计	被引频次：12[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/95336
专题	中国科学院金属研究所
通讯作者	Chan, Sammy Lap Ip
作者单位	1.Univ New S Wales, Sch Mat Sci & Engn, Sydney, NSW 2052, Australia 2.Guilin Univ Elect Technol, Ctr Mat Sci & Engn, Guilin 541004, Guangxi, Peoples R China 3.Chinese Acad Sci, Inst Met Res, Beijing 100864, Peoples R China
推荐引用方式 GB/T 7714	Li, Chi Ying Vanessa,Wang, Zhong Min,Liu, Shi,et al. Electrochemical characteristics of La-Ni-Al thin films[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2008,456(1-2):407-412.
APA	Li, Chi Ying Vanessa,Wang, Zhong Min,Liu, Shi,&Chan, Sammy Lap Ip.(2008).Electrochemical characteristics of La-Ni-Al thin films.JOURNAL OF ALLOYS AND COMPOUNDS,456(1-2),407-412.
MLA	Li, Chi Ying Vanessa,et al."Electrochemical characteristics of La-Ni-Al thin films".JOURNAL OF ALLOYS AND COMPOUNDS 456.1-2(2008):407-412.