Effect of Al content on the electrochemical properties of Mg2-xAlxNi thin film hydride electrodes

doi:10.1016/j.electacta.2009.08.024

IMR OpenIR

	Effect of Al content on the electrochemical properties of Mg2-xAlxNi thin film hydride electrodes
	Xu, Junli 2; Li, Ying 1; Wang, Fuhui 1
通讯作者	Li, Ying(liying@imr.ac.cn)
	2009-12-15
发表期刊	ELECTROCHIMICA ACTA
ISSN	0013-4686
卷号	55 期号:1 页码:148-154
摘要	Thin films of Mg2-xAlxNi alloys have been prepared by magnetron sputtering, and the effects of partial substitution of Al for Mg on the electrochemical properties of the films were studied. EIS results indicate the rate-limiting process for the thin film hydride electrode is the charge transfer reaction during the process of total discharge. A theoretical model has been derived for the impedance of a thin film hydride electrode based upon the assumption that hydrogen diffusion is neglected in the electrode. The charge-transfer reaction rate at the electrode surface and hydrogen diffusivity in the Mg2-xAlxNi thin film hydride electrodes were observed to initially decrease then increase with increasing Al content. Results from capacitance measurements indicate n-type semiconductor properties for the corrosion layer during the charge-discharge process. Hydrogen atom and OH- transfer became more difficult with increasing Al content until x=0.3, after which a significant drop in the barrier resistance was observed. (C) 2009 Elsevier Ltd. All rights reserved.
关键词	Thin film Partial substitution Faradic admittance Hydrogen diffusivity Electronic properties
DOI	10.1016/j.electacta.2009.08.024
收录类别	SCI
语种	英语
WOS研究方向	Electrochemistry
WOS类目	Electrochemistry
WOS记录号	WOS:000271152200019
出版者	PERGAMON-ELSEVIER SCIENCE LTD
引用统计	被引频次：9[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/95791
专题	中国科学院金属研究所
通讯作者	Li, Ying
作者单位	1.Chinese Acad Sci, State Key Lab Corros & Protect, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China 2.Northeastern Univ, Coll Sci, Shenyang 110004, Liaoning, Peoples R China
推荐引用方式 GB/T 7714	Xu, Junli,Li, Ying,Wang, Fuhui. Effect of Al content on the electrochemical properties of Mg2-xAlxNi thin film hydride electrodes[J]. ELECTROCHIMICA ACTA,2009,55(1):148-154.
APA	Xu, Junli,Li, Ying,&Wang, Fuhui.(2009).Effect of Al content on the electrochemical properties of Mg2-xAlxNi thin film hydride electrodes.ELECTROCHIMICA ACTA,55(1),148-154.
MLA	Xu, Junli,et al."Effect of Al content on the electrochemical properties of Mg2-xAlxNi thin film hydride electrodes".ELECTROCHIMICA ACTA 55.1(2009):148-154.