| Enhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine | |
| Li Wen1; Leng Wen-Hua1; Niu Zhen-Jiang2; Li Xiang1; Fei Hui1; Zhang Jian-Qing1; Cao Chu-Nan1,3 | |
| Corresponding Author | Leng Wen-Hua(lengwh@zju.edu.cn) |
| 2009-12-01 | |
| Source Publication | ACTA PHYSICO-CHIMICA SINICA
 |
| ISSN | 1000-6818 |
| Volume | 25Issue:12Pages:2427-2432 |
| Abstract | A new and simple method of electrochemical etching in acidic aqueous solutions containing fluorine for the electrodeposited WO3 thin films is presented. The samples were characterized by photoelectrochemistry, scanning electron microscopy (SEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), UV-Vis diffuse reflectance spectroscopy, and photoluminescence (PL). Results showed that the etching increased the specific surface area with a concomitant reduction in the catalyst mass and also a change in the surface status of the electrodes. This modification of the surface status improved the photoelectrochemical performance of the electrodes under visible and UV-Vis light illumination with the same mass and specific surface area. This enhancement can be ascribed to the surface fluorination of the electrodes, which result in a decrease in the surface recombination centers and a negative shift in the flatband potential. The light absorption and crystalline were found to be unchanged by etching. The etched WO3 film electrode shows excellent photoelectrochemical stability in acid solutions. This provides a novel method for increasing the photon electric conversion efficiency of WO3 thin film electrodes. |
| Keyword | WO3 Electrochemical etching Fluorination Photoelectrochemistry Visible light |
| Funding Organization | National Natural Science Foundation of China |
| DOI | 10.3866/PKU.WHXB20091210 |
| Indexed By | SCI |
| Language | 英语 |
| Funding Project | National Natural Science Foundation of China[20373062] |
| WOS Research Area | Chemistry |
| WOS Subject | Chemistry, Physical |
| WOS ID | WOS:000272817500005 |
| Publisher | PEKING UNIV PRESS |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.imr.ac.cn/handle/321006/97487 |
| Collection | 中国科学院金属研究所 |
| Corresponding Author | Leng Wen-Hua |
| Affiliation | 1.Zhejiang Univ, Dept Chem, Hangzhou 310027, Zhejiang, Peoples R China 2.Zhejiang Normal Univ, Inst Phys Chem, Jinhua 321004, Zhejiang, Peoples R China 3.Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect Met, Shenyang 110016, Peoples R China |
| Recommended Citation GB/T 7714 | Li Wen,Leng Wen-Hua,Niu Zhen-Jiang,et al. Enhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine[J]. ACTA PHYSICO-CHIMICA SINICA,2009,25(12):2427-2432. |
| APA | Li Wen.,Leng Wen-Hua.,Niu Zhen-Jiang.,Li Xiang.,Fei Hui.,...&Cao Chu-Nan.(2009).Enhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine.ACTA PHYSICO-CHIMICA SINICA,25(12),2427-2432. |
| MLA | Li Wen,et al."Enhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine".ACTA PHYSICO-CHIMICA SINICA 25.12(2009):2427-2432. |
| Files in This Item: | There are no files associated with this item. | |||||
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment