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Enhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine
Li Wen1; Leng Wen-Hua1; Niu Zhen-Jiang2; Li Xiang1; Fei Hui1; Zhang Jian-Qing1; Cao Chu-Nan1,3
Corresponding AuthorLeng Wen-Hua(lengwh@zju.edu.cn)
2009-12-01
Source PublicationACTA PHYSICO-CHIMICA SINICA
ISSN1000-6818
Volume25Issue:12Pages:2427-2432
AbstractA new and simple method of electrochemical etching in acidic aqueous solutions containing fluorine for the electrodeposited WO3 thin films is presented. The samples were characterized by photoelectrochemistry, scanning electron microscopy (SEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), UV-Vis diffuse reflectance spectroscopy, and photoluminescence (PL). Results showed that the etching increased the specific surface area with a concomitant reduction in the catalyst mass and also a change in the surface status of the electrodes. This modification of the surface status improved the photoelectrochemical performance of the electrodes under visible and UV-Vis light illumination with the same mass and specific surface area. This enhancement can be ascribed to the surface fluorination of the electrodes, which result in a decrease in the surface recombination centers and a negative shift in the flatband potential. The light absorption and crystalline were found to be unchanged by etching. The etched WO3 film electrode shows excellent photoelectrochemical stability in acid solutions. This provides a novel method for increasing the photon electric conversion efficiency of WO3 thin film electrodes.
KeywordWO3 Electrochemical etching Fluorination Photoelectrochemistry Visible light
Funding OrganizationNational Natural Science Foundation of China
DOI10.3866/PKU.WHXB20091210
Indexed BySCI
Language英语
Funding ProjectNational Natural Science Foundation of China[20373062]
WOS Research AreaChemistry
WOS SubjectChemistry, Physical
WOS IDWOS:000272817500005
PublisherPEKING UNIV PRESS
Citation statistics
Cited Times:4[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/97487
Collection中国科学院金属研究所
Corresponding AuthorLeng Wen-Hua
Affiliation1.Zhejiang Univ, Dept Chem, Hangzhou 310027, Zhejiang, Peoples R China
2.Zhejiang Normal Univ, Inst Phys Chem, Jinhua 321004, Zhejiang, Peoples R China
3.Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect Met, Shenyang 110016, Peoples R China
Recommended Citation
GB/T 7714
Li Wen,Leng Wen-Hua,Niu Zhen-Jiang,et al. Enhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine[J]. ACTA PHYSICO-CHIMICA SINICA,2009,25(12):2427-2432.
APA Li Wen.,Leng Wen-Hua.,Niu Zhen-Jiang.,Li Xiang.,Fei Hui.,...&Cao Chu-Nan.(2009).Enhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine.ACTA PHYSICO-CHIMICA SINICA,25(12),2427-2432.
MLA Li Wen,et al."Enhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine".ACTA PHYSICO-CHIMICA SINICA 25.12(2009):2427-2432.
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