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Enhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine
Li Wen1; Leng Wen-Hua1; Niu Zhen-Jiang2; Li Xiang1; Fei Hui1; Zhang Jian-Qing1; Cao Chu-Nan1,3
通讯作者Leng Wen-Hua(lengwh@zju.edu.cn)
2009-12-01
发表期刊ACTA PHYSICO-CHIMICA SINICA
ISSN1000-6818
卷号25期号:12页码:2427-2432
摘要A new and simple method of electrochemical etching in acidic aqueous solutions containing fluorine for the electrodeposited WO3 thin films is presented. The samples were characterized by photoelectrochemistry, scanning electron microscopy (SEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), UV-Vis diffuse reflectance spectroscopy, and photoluminescence (PL). Results showed that the etching increased the specific surface area with a concomitant reduction in the catalyst mass and also a change in the surface status of the electrodes. This modification of the surface status improved the photoelectrochemical performance of the electrodes under visible and UV-Vis light illumination with the same mass and specific surface area. This enhancement can be ascribed to the surface fluorination of the electrodes, which result in a decrease in the surface recombination centers and a negative shift in the flatband potential. The light absorption and crystalline were found to be unchanged by etching. The etched WO3 film electrode shows excellent photoelectrochemical stability in acid solutions. This provides a novel method for increasing the photon electric conversion efficiency of WO3 thin film electrodes.
关键词WO3 Electrochemical etching Fluorination Photoelectrochemistry Visible light
资助者National Natural Science Foundation of China
DOI10.3866/PKU.WHXB20091210
收录类别SCI
语种英语
资助项目National Natural Science Foundation of China[20373062]
WOS研究方向Chemistry
WOS类目Chemistry, Physical
WOS记录号WOS:000272817500005
出版者PEKING UNIV PRESS
引用统计
被引频次:4[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.imr.ac.cn/handle/321006/97487
专题中国科学院金属研究所
通讯作者Leng Wen-Hua
作者单位1.Zhejiang Univ, Dept Chem, Hangzhou 310027, Zhejiang, Peoples R China
2.Zhejiang Normal Univ, Inst Phys Chem, Jinhua 321004, Zhejiang, Peoples R China
3.Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect Met, Shenyang 110016, Peoples R China
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GB/T 7714
Li Wen,Leng Wen-Hua,Niu Zhen-Jiang,et al. Enhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine[J]. ACTA PHYSICO-CHIMICA SINICA,2009,25(12):2427-2432.
APA Li Wen.,Leng Wen-Hua.,Niu Zhen-Jiang.,Li Xiang.,Fei Hui.,...&Cao Chu-Nan.(2009).Enhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine.ACTA PHYSICO-CHIMICA SINICA,25(12),2427-2432.
MLA Li Wen,et al."Enhanced Photoelectrochemical Performance of WO3 Film Electrode under Visible Light by Electrochemical Etching Fluorination in Aqueous Solutions Containing Fluorine".ACTA PHYSICO-CHIMICA SINICA 25.12(2009):2427-2432.
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