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Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)] 期刊论文
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2019, 卷号: 166, 期号: 10, 页码: Y17-Y26
作者:  Huttunen-Saarivirta, E.;  Rajala, P.;  Carpen, L.;  Wang, J.;  Liu, F.;  Ghanbari, E.;  Mao, F.;  Dong, C.;  Yang, J.;  Sarifi-Asl, S.;  Macdonald, D. D.
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Response to Comments on E. Huttunen-Saarivirta et al., "Kinetic Properties of the Passive Film on Copper in the Presence of Sulfate-Reducing Bacteria" [J. Electrochem. Soc., 165, C450 (2018)] 期刊论文
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2019, 卷号: 166, 期号: 10, 页码: Y17-Y26
作者:  Huttunen-Saarivirta, E.;  Rajala, P.;  Carpen, L.;  Wang, J.;  Liu, F.;  Ghanbari, E.;  Mao, F.;  Dong, C.;  Yang, J.;  Sarifi-Asl, S.;  Macdonald, D. D.
收藏  |  浏览/下载:112/0  |  提交时间:2021/02/02