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Effect of Initial Oxide Film on the Formation and Performance of Plasma Electrolytic Oxidation Coating on 7075 Aluminum Alloy 期刊论文
ACTA METALLURGICA SINICA-ENGLISH LETTERS, 2022, 页码: 13
作者:  Zhu, Mingyu;  Song, Yingwei;  Dong, Kaihui;  Shan, Dayong;  Han, En-Hou
收藏  |  浏览/下载：80/0  |  提交时间：2022/07/01
Aluminum alloys  Plasma electrolytic oxidation  Initial oxide film  Growth process  Spark discharge  Compactness  
Fast simulations of a large number of crystals growth in centimeter-scale during alloy solidification via nonlinearly preconditioned quantitative phase-field formula 期刊论文
COMPUTATIONAL MATERIALS SCIENCE, 2018, 卷号: 147, 页码: 338-352
作者:  Gong, TZ;  Chen, Y;  Cao, YF;  Kang, XH;  Li, DZ;  Chen, Y (reprint author), Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Liaoning, Peoples R China.
收藏  |  浏览/下载：198/0  |  提交时间：2018/06/05
X-ray Radiography  Adaptive Mesh Refinement  Sample Directional Solidification  Al-cu Alloy  Dendritic Growth  Polycrystalline Solidification  Efficient Computation  Initial Transient  Model  Microstructures  
Tip-splitting instability and transition to seaweed growth during alloy solidification in anisotropically preferred growth direction 期刊论文
Acta Materialia, 2014, 卷号: 66, 页码: 219-231
作者:  Y. Chen;  B. Billia;  D. Z. Li;  H. Nguyen-Thi;  N. M. Xiao;  A. A. Bogno
收藏  |  浏览/下载：131/0  |  提交时间：2014/04/18
Seaweed  Tip Splitting  Noise  Alloy Directional Solidification  Phase-field  X-ray Radiography  Al-cu Alloy  Diffusional Growth  Morphology Diagram  Initial Transient  Dendritic Solidification  Future-directions  Crystal-growth  Binary Alloy  3 Dimensions  
Quantitative Phase-field Simulation of Dendritic Equiaxed Growth and Comparison with in Situ Observation on Al-4 wt.% Cu Alloy by Means of Synchrotron X-ray Radiography 期刊论文
Isij International, 2014, 卷号: 54, 期号: 2, 页码: 445-451
作者:  Y. Chen;  D. Z. Li;  B. Billia;  H. Nguyen-Thi;  X. B. Qi;  N. M. Xiao
收藏  |  浏览/下载：133/0  |  提交时间：2014/04/18
Phase-field Simulation  Dendritic Equiaxed Growth  Grain Interaction  Solidification  Alloy  In Situ Synchrotron imagIng  Directional Solidification  Initial Transient  Convection  Anisotropy  Interface  
First-principles study of influence of Ti vacancy and Nb dopant on the bonding of TiAl/TiO2 interface 期刊论文
Intermetallics, 2014, 卷号: 49, 页码: 1-6
作者:  Y. Song;  F. J. Xing;  J. H. Dai;  R. Yang
收藏  |  浏览/下载：133/0  |  提交时间：2014/07/03
Titanium Aluminides Based On Tial  Oxidation  Ab-initio Calculations  Phase Interfaces  Oxidation Behavior  Gamma-tial(111) Surface  Titanium Aluminides  Initial Oxidation  Alloys  Temperature  Resistance  Growth  Energy  Oxygen  
Phase-field Modeling of the Initial Transient in Directional Solidification of Al-4wt%Cu Alloy 期刊论文
Isij International, 2010, 卷号: 50, 期号: 12, 页码: 1895-1900
作者:  Y. Chen;  A. A. Bogno;  B. Billia;  X. H. Kang;  H. Nguyen-Thi;  D. Z. Li;  X. H. Luo;  J. M. Debierre
Adobe PDF(1375Kb)  |  收藏  |  浏览/下载：108/0  |  提交时间：2012/04/13
Directional Solidification  Alloys  Initial Transient  Microstructure  Transition  Phase-field Modeling  Al-cu Alloy  Synchrotron  x Ray  Imaging  Free Dendritic Growth  Finite-element-method  Binary Alloy  Numerical  Simulations  Crystal-growth  Cu Alloy  Computation  Prediction  Stability  
Morphology evolution of alumina scales formed on NiAl with and without 0.5 at.% Ag at 1273K 期刊论文
High Temperature Materials and Processes, 2005, 卷号: 24, 期号: 1, 页码: 17-28
作者:  X. J. Zhang;  W. T. Wu;  J. T. Guo;  Y. Niu
收藏  |  浏览/下载：72/0  |  提交时间：2012/04/14
Beta-nial  Silver  Oxidation  Gamma-al2o3  Theta-al2o3  Alpha-al2o3  Transformation  Oxidation Behavior  Transient Oxidation  Intergranular Oxidation  Isothermal Oxidation  Ion-implantation  Growth-mechanism  Initial-stages  Base Alloys  Coatings  Nickel  
Influence of quantity and energy of the particles in gas phase on nucleation of the HFCVD of diamond films 期刊论文
Materials Letters, 2001, 卷号: 48, 期号: 1, 页码: 41135
作者:  G. H. Song;  C. Sun;  B. Wang;  A. Y. Wang;  R. F. Huang;  L. S. Wen
收藏  |  浏览/下载：69/0  |  提交时间：2012/04/14
Diamond Film  Hot Filament Chemical Vapor Deposition (Hfcvd)  Nucleation  Density  Mass Current Density  Substrate Bias  Chemical-vapor-deposition  Amorphous-carbon  Initial Growth  Flow Rate  Mechanism