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Effect of negative bias on the composition and structure of the tungsten oxide thin films deposited by magnetron sputtering 期刊论文
APPLIED SURFACE SCIENCE, 2015, 卷号: 359, 页码: 521-525
作者:  Wang, Meihan;  Lei, Hao;  Wen, Jiaxing;  Long, Haibo;  Sawada, Yutaka;  Hoshi, Yoichi;  Uchida, Takayuki;  Hou, Zhaoxia;  haolei@imr.ac.cn
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Tungsten Oxide Thin Films  Magnetron Sputtering  Negative Bias Voltage (V-b)  Structure  Composition