IMR OpenIR

Browse/Search Results:  1-2 of 2 Help

Filters    
Selected(0)Clear Items/Page:    Sort:
Pulsed laser deposition of aluminate YAlO3 and LaAlO3 thin films for alternative gate dielectric applications 期刊论文
Applied Physics a-Materials Science & Processing, 2005, 卷号: 80, 期号: 8, 页码: 1775-1779
Authors:  J. M. Liu;  G. H. Shi;  L. C. Yu;  T. L. Li;  Z. G. Liu;  J. Y. Dai
Favorite  |  View/Download:154/0  |  Submit date:2012/04/14
Hafnium Oxide  Si  Stability  Silicon  Transition  Dioxide  Devices  Hfo2  
Pulsed laser deposition of aluminate YAlO3 and LaAlO3 thin films for alternative gate dielectric applications 期刊论文
Applied Physics a-Materials Science & Processing, 2005, 卷号: 80, 期号: 8, 页码: 1775-1779
Authors:  J. M. Liu;  G. H. Shi;  L. C. Yu;  T. L. Li;  Z. G. Liu;  J. Y. Dai
Favorite  |  View/Download:178/0  |  Submit date:2012/05/17
Hafnium Oxide  Si  Stability  Silicon  Transition  Dioxide  Devices  Hfo2