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Molecular dynamics studies on vacancy movement in crystalline silicon 期刊论文
ACTA METALLURGICA SINICA, 2005, 卷号: 41, 期号: 3, 页码: 231-234
Authors:  Qiao, YH;  Wang, SQ
Favorite  |  View/Download：6/0  |  Submit date：2021/02/02
Si crystal  vacancy migration energy  molecular dynamics  diffusion