The latest progress in TiO2 films grown by magnetron sputtering or followed by sixrface modification,were tentatively reviewed with discussion focused on the influence of its growth conditions, such as deposition rate, type and pressure of the sputtering gas, target tempera- ture and voltage, and annealing, on its mierostruetures and properties. The phases of anatase, rutile and amorphous TiO2 films can be well controlled to meet the demands of different applications. Moreover, its limitations can possibly be removed with appropriate surface modifications to improve its favorable properties.
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