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Si含量对电弧离子镀Ti-A1-Si-N薄膜组织结构和力学性能的影响
Alternative TitleEFFECT OF Si CONTENT ON THE MICROSTRUCTURE AND MECHANICAL PROPERTIES OF Ti-A1-Si-N FILMS DEPOSITED BY CATHODIC VACUUM ARC ION PLATING
时婧1; 裴志亮1; 宫骏1; 孙超1; Muders C M2; 姜辛2
2012
Source Publication金属学报
ISSN0412-1961
Volume48Issue:11Pages:1349-1356
Abstract利用磁过滤电弧离子镀技术在高速钢基体上制备了不同Si含量的Ti-Al-Si-N薄膜,研究了Si含量对薄膜组织结构以及力学性能的影响。结果表明,Ti-Al-Si-N薄膜主要由晶态TiAlN和非晶态的Si_3N_4组成,随着Si含量的增加,XRD衍射峰强度减弱,晶粒尺寸减小;薄膜的显微组织也由明显的柱状晶转变为致密的纳米晶结构.利用纳米硬度仪对薄膜的硬度和弹性模量进行了分析,结果表明,薄膜的硬度和弹性模量有着相似的变化趋势,随着Si含量的增加,两者都先增加,当Si含量达到一定程度时,它们会逐渐稳定在一定范围内,而后又随Si含量的继续增加呈下降趋势.通过划痕测试对薄膜结合强度进行了分析,结果表明,薄膜与基体的结合强度随Si含量的增加先减小而后增加.
Keyword磁过滤电弧离子镀 Ti-Al-Si-N薄膜 纳米硬度 结合强度
Indexed ByCSCD
Language中文
CSCD IDCSCD:4696446
Citation statistics
Cited Times:13[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://ir.imr.ac.cn/handle/321006/149257
Collection中国科学院金属研究所
Affiliation1.中国科学院金属研究所
2.Institute of Materials Engineering, University of Siegen
Recommended Citation
GB/T 7714
时婧,裴志亮,宫骏,等. Si含量对电弧离子镀Ti-A1-Si-N薄膜组织结构和力学性能的影响[J]. 金属学报,2012,48(11):1349-1356.
APA 时婧,裴志亮,宫骏,孙超,Muders C M,&姜辛.(2012).Si含量对电弧离子镀Ti-A1-Si-N薄膜组织结构和力学性能的影响.金属学报,48(11),1349-1356.
MLA 时婧,et al."Si含量对电弧离子镀Ti-A1-Si-N薄膜组织结构和力学性能的影响".金属学报 48.11(2012):1349-1356.
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