Alternative TitleInfluence of deposition time on TiO2 photocatalyst films deposited by dc reactive magnetron sputtering
张文杰; 朱圣龙; 李瑛; 王福会; 何红波
Source Publication功能材料
Other AbstractTiO2 thin films with photocatalytic activity were deposited on microscope glass slides by means of dc magnetron sputtering. Uniform and transparent TiO2 thin films could be prepared when oxygen flow rate surpassed its threshold. The substrate temperature ran up quickly to 110℃ in the first hour and the final substrate temperature after seven hours was no more than 130℃. The film deposited for two hours was amorphous, whereas anatase crystal phase appeared in the film deposited from three to seven hours. The amorphous films and the films composed of small crystalline particles performed quantum size effects and their band edges had a blue shift compared with the well-crystallized films. The titanium in the films was in the oxidation state of Ti^4+. The transmittance of the films decreased and the photocatalytic activity of the films increased steadily with increasing deposition time and film thickness.
Keyword磁控反应溅射 TiO2薄膜 光催化 沉积时间
Indexed ByCSCD
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Cited Times:6[CSCD]   [CSCD Record]
Document Type期刊论文
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GB/T 7714
张文杰,朱圣龙,李瑛,等. 沉积时间对磁控反应溅射制备TiO2薄膜性能的影响[J]. 功能材料,2008,39.0(011):1785-1788.
APA 张文杰,朱圣龙,李瑛,王福会,&何红波.(2008).沉积时间对磁控反应溅射制备TiO2薄膜性能的影响.功能材料,39.0(011),1785-1788.
MLA 张文杰,et al."沉积时间对磁控反应溅射制备TiO2薄膜性能的影响".功能材料 39.0.011(2008):1785-1788.
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