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Reactive sputter deposition of WO3 films by using two deposition methods 期刊论文
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2019, 卷号: 37, 期号: 3, 页码: 6
作者:  Yasuda, Yoji;  Hoshi, Yoichi;  Kobayashi, Shin-ichi;  Uchida, Takayuki;  Sawada, Yutaka;  Wang, Meihan;  Lei, Hao
收藏  |  浏览/下载：128/0  |  提交时间：2021/02/02
Effect of negative bias on the composition and structure of the tungsten oxide thin films deposited by magnetron sputtering 期刊论文
APPLIED SURFACE SCIENCE, 2015, 卷号: 359, 页码: 521-525
作者:  Wang, Meihan;  Lei, Hao;  Wen, Jiaxing;  Long, Haibo;  Sawada, Yutaka;  Hoshi, Yoichi;  Uchida, Takayuki;  Hou, Zhaoxia;  haolei@imr.ac.cn
收藏  |  浏览/下载：130/0  |  提交时间：2016/04/21
Tungsten Oxide Thin Films  Magnetron Sputtering  Negative Bias Voltage (V-b)  Structure  Composition  
Low-Resistivity Indium-Tin-Oxide Transparent Conducting Films: Dependence of Carrier Electron Concentration on Tin Concentration 期刊论文
PROCEEDINGS OF THE 2015 INTERNATIONAL CONFERENCE ON MATERIAL SCIENCE AND APPLICATIONS (ICMSA 2015), 2015, 卷号: 3, 页码: 719-722
作者:  Sawada, Yutaka;  Seki, Shigeyuki;  Uchida, Takayuki;  Hoshi, Yoichi;  Wang, Mei-Han;  Lei, Hao;  Sun, Li-Xian;  sawada@chem.t-kougei.ac.jp;  nariyuki@sendai-nct.ac.jp;  uchida@mega.t-kougei.ac.jp;  hoshi@em.t-kougei.ac.jp;  wangmhdicp@aliyun.com;  haolei@imr.ac.cn;  sunlx@guet.edu.cn
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Ito  Tin-doped In2o3  Spray Chemical Vapor Deposition