Effect of applied magnetic field on the electroplating and magnetic properties of amorphous FeNiPGd thin film

doi:10.1016/j.jmmm.2019.165872

IMR OpenIR

	Effect of applied magnetic field on the electroplating and magnetic properties of amorphous FeNiPGd thin film
	Yang, Lin-Lin 1,2; Chen, Chunhuan 1; Yuan, Jie 2; Gao, Li-Yin 2,4; Shang, Zhengang 3; Liu, Zhi-Quan 2,4
通讯作者	Liu, Zhi-Quan(zqliu@siat.ac.cn)
	2020-02-01
发表期刊	JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
ISSN	0304-8853
卷号	495 页码:7
摘要	Uniaxial magnetic anisotropy has been induced in multi-element soft magnetic amorphous FeNiPGd thin films, which were fabricated by electroplating with an external magnetic field applied parallel to the plane of the electrode. After the application of the magnetic field, surface morphology of the FeNiPGd layer is improved. The crystal grains are refined, and the number of pores generated on the surface is remarkably reduced. The introduction of external magnetic field can significantly improve the deposition rate and dynamic permeability. And the cutoff frequency can achieve 500 MHz when the applied magnetic field is 40 mT during the deposition process. Specifically, the in-plane anisotropy field of the film was calculated by the area integral method to be approximately 116Oe while the magnetic field is 10 mT, which is obviously higher than that of the binary FeNi material.
关键词	FeNiPGd thin film Electroplating External magnetic field In-plane anisotropy Dynamic permeability
资助者	National and Local Joint Engineering Laboratory of Advanced Electronic Packaging Materials (Shenzhen Development and Reform Commission) ; Hundred Talents Program of the Chinese Academy of Sciences
DOI	10.1016/j.jmmm.2019.165872
收录类别	SCI
语种	英语
资助项目	National and Local Joint Engineering Laboratory of Advanced Electronic Packaging Materials (Shenzhen Development and Reform Commission) ; Hundred Talents Program of the Chinese Academy of Sciences
WOS研究方向	Materials Science ; Physics
WOS类目	Materials Science, Multidisciplinary ; Physics, Condensed Matter
WOS记录号	WOS:000492698500016
出版者	ELSEVIER
引用统计	被引频次：6[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.imr.ac.cn/handle/321006/137069
专题	中国科学院金属研究所
通讯作者	Liu, Zhi-Quan
作者单位	1.Dalian Jiaotong Univ, Sch Mat Sci & Engn, Dalian 116024, Peoples R China 2.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China 3.Cent S Univ, Adv Res Ctr, Changsha 410083, Hunan, Peoples R China 4.Chinese Acad Sci, Shenzhen Inst Adv Elect Mat, Shenzhen Inst Adv Technol, Shenzhen 518055, Peoples R China
推荐引用方式 GB/T 7714	Yang, Lin-Lin,Chen, Chunhuan,Yuan, Jie,et al. Effect of applied magnetic field on the electroplating and magnetic properties of amorphous FeNiPGd thin film[J]. JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS,2020,495:7.
APA	Yang, Lin-Lin,Chen, Chunhuan,Yuan, Jie,Gao, Li-Yin,Shang, Zhengang,&Liu, Zhi-Quan.(2020).Effect of applied magnetic field on the electroplating and magnetic properties of amorphous FeNiPGd thin film.JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS,495,7.
MLA	Yang, Lin-Lin,et al."Effect of applied magnetic field on the electroplating and magnetic properties of amorphous FeNiPGd thin film".JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS 495(2020):7.