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Mechanical, Microstructural and Tribological Properties of Reactive Magnetron Sputtered Cr-Mo-N Films 期刊论文
Journal of Materials Science & Technology, 2015, 卷号: 31, 期号: 1, 页码: 55-64
作者:  D. L.;  Lei Qi, H.;  Wang, T. G.;  Pei, Z. L.;  Gong, J.;  Sun, C.
收藏  |  浏览/下载：141/0  |  提交时间：2015/05/08
Cr-mo-n Films  Dc Magnetron Sputtering  Hardness  Critical Load  Friction Coefficient  Wear  Nitride Thin-films  Substrate Bias  Nitrogen Flow  Coatings  Hardness  Temperature  Pvd  Modulus  Ratio  Dc  
Effect of electromagnetic swirling flow in slide-gate SEN on flow field in square billet continuous casting mold 期刊论文
ACTA METALLURGICA SINICA-ENGLISH LETTERS, 2012, 卷号: 25, 期号: 5, 页码: 347-356
作者:  Geng Dianqiao;  Lei Hong;  He Jicheng;  Liu Haitao
收藏  |  浏览/下载：125/0  |  提交时间：2021/02/02
SUBMERGED ENTRY NOZZLE  MOLTEN STEEL FLOW  IMMERSION NOZZLE  FLUID-FLOW  NUMERICAL-SIMULATION  TURBULENT-FLOW  HEAT-TRANSFER  TEMPERATURE DISTRIBUTION  MODEL  SLAB  Square billet  Electromagnetic swirling flow  Slide-gate SEN  Continuous casting  Bias flow  
Deposition of thick TiAlN coatings on 2024 Al/SiC(p) substrate by Arc ion plating 期刊论文
Surface & Coatings Technology, Surface & Coatings Technology, 2008, 2008, 卷号: 202, 202, 期号: 21, 页码: 5170-5174, 5170-5174
作者:  S. S. Zhao;  H. Du;  J. D. Zheng;  Y. Yang;  W. Wang;  J. Gong;  C. Sun
Adobe PDF(456Kb)  |  收藏  |  浏览/下载：144/0  |  提交时间：2012/04/13
Gradient Tialn Coating  (Ti  Gradient Tialn Coating  (Ti  Al/sic(p) Substrate  Al)n Coatings  Al/sic(p) Substrate  Al)n Coatings  Arc Ion Plating  Arc Ion Plating  Nitrogen  Nitrogen  Flow Rate  Flow Rate  Cathodic Vacuum-arc  Cathodic Vacuum-arc  Hard Coatings  Hard Coatings  Cutting Tools  Cutting Tools  Films  Films  Pressure  Pressure  Performance  Performance  Contact  Contact  Bias  Bias  
Influence of quantity and energy of the particles in gas phase on nucleation of the HFCVD of diamond films 期刊论文
Materials Letters, 2001, 卷号: 48, 期号: 1, 页码: 41135
作者:  G. H. Song;  C. Sun;  B. Wang;  A. Y. Wang;  R. F. Huang;  L. S. Wen
收藏  |  浏览/下载：69/0  |  提交时间：2012/04/14
Diamond Film  Hot Filament Chemical Vapor Deposition (Hfcvd)  Nucleation  Density  Mass Current Density  Substrate Bias  Chemical-vapor-deposition  Amorphous-carbon  Initial Growth  Flow Rate  Mechanism