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Effect of negative bias on the composition and structure of the tungsten oxide thin films deposited by magnetron sputtering 期刊论文
APPLIED SURFACE SCIENCE, 2015, 卷号: 359, 页码: 521-525
作者:  Wang, Meihan;  Lei, Hao;  Wen, Jiaxing;  Long, Haibo;  Sawada, Yutaka;  Hoshi, Yoichi;  Uchida, Takayuki;  Hou, Zhaoxia;  haolei@imr.ac.cn
收藏  |  浏览/下载:128/0  |  提交时间:2016/04/21
Tungsten Oxide Thin Films  Magnetron Sputtering  Negative Bias Voltage (V-b)  Structure  Composition  
Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis 期刊论文
Surface & Coatings Technology, 2012, 卷号: 206, 期号: 10, 页码: 2629-2637
作者:  T. G. Wang;  D. Jeong;  S. H. Kim;  Q. Wang;  D. W. Shin;  S. Melin;  S. Iyengar;  K. H. Kim
收藏  |  浏览/下载:189/0  |  提交时间:2013/02/05
Cr2o3 Film  Arc Ion Plating  Bias Voltage  Grain Size  Surface  Morphology  Hrtem  Chromium-oxide Coatings  Pulsed-laser Deposition  Negative Bias Voltage  Si-n Coatings  Thin-films  Mechanical-properties  Optical-properties  Nitrogen Pressure  Vapor-deposition  Residual-stress  
Microstructural control of Cr-Si-N films by a hybrid arc ion plating and magnetron sputtering process 期刊论文
Acta Materialia, 2009, 卷号: 57, 期号: 17, 页码: 4974-4987
作者:  Q. M. Wang;  K. H. Kim
Adobe PDF(2672Kb)  |  收藏  |  浏览/下载:119/0  |  提交时间:2012/04/13
Cr-si-n  Nanocomposite  Physical Vapor Deposition  Nanocrystalline  Microstructure  Transmission Electron Microscopy  Nanocomposite Thin-films  Negative Bias Voltage  Mechanical-properties  Coating System  Cathodic Arc  Deposition  Silicon  Growth  Layer  Hard  
Study of (Ti,Al)N coatings on SiCp/Al substrate 期刊论文
ACTA METALLURGICA SINICA, 2004, 卷号: 40, 期号: 7, 页码: 745-748
作者:  Zheng, JD;  Zou, YS;  Song, GH;  Gong, J;  Liu, Y;  Sun, C;  Wen, LS
收藏  |  浏览/下载:77/0  |  提交时间:2021/02/02
(Ti, Al)N coating  SiCp/Al composite  arc ion plating  negative bias voltage